Used NIKON NSR 2005 i8A #9041676 for sale

NIKON NSR 2005 i8A Wafer Stepper is an advanced, high-resolution lithography equipment used to print extremely small and intricate features on semiconductor wafers. The system operates with a high numerical aperture (NA) projection lens and high resolution to accurately transfer a microscopic image onto a photoresist-coated wafer. It is capable of printing features as small as 1.2µm with a crisp, high-definition image. NIKON NSR 2005I8A has a sophisticated imaging unit setup that consists of an Illuminator, Exposing Lens, Stage, and Sensor. The illuminator produces a powerful light which is then controlled and condensed by the Exposing Lens. The resulting image is projected onto the wafer, which is held on the stage, thanks to a vacuum chuck with high precision positioning and controlled mechanical movement. This stage is also able to rotate, tilt and shift the wafer for greater exposure accuracy. The Sensor is integrated into the machine and is used to monitor and optimize the exposure dose for the wafer. Its sophisticated algorithm works in real-time and adjusts the exposure condition to ensure the best possible results. It is also capable of detecting any exposure problems which could negatively affect the lithography performance. NSR-2005I8A also features a suite of software options to help automate exposure parameter control and digital image processing. The tool has been designed to be robust and reliable, allowing it to work in an optimized fashion with repeatable performance. This is achieved through an advanced digital signal processor (DSP) asset and a high-resolution CCD camera which is used to capture and store the pattern data. Finally, NSR 2005I8A is also equipped with a cleaning model which uses ion milling technology to ensure the optics equipment is kept clean and free from contaminants which could otherwise interfere with the accuracy and stability of the exposure process. In conclusion, NIKON NSR 2005 I 8 A is an advanced and highly accurate wafer stepper system with a range of features that help to deliver high-precision lithography results. Its sophisticated imaging and exposure systems ensure the wafer is exposed to the exact conditions to produce the desired pattern. The use of advanced software and hardware also helps to automate, optimize and monitor the exposure process, allowing it to work at its maximum efficiency. The overall design of NSR-2005 I8A allows it to produce high-resolution, high-definition images, even at sub-micron levels, with consistently high performance.