Used NIKON NSR 2005 i8A #9041776 for sale
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ID: 9041776
Stepper, 6"
Basic version: MCS2
Main computer:
System: PDP11/73, VT-284
CRT Monitor
Hard disk: RZ26L-E
(1) Disk drive: 5.25"
Illumination type: Normal
Wafer stage: Ring type chuck, Ball screw type
Interferometer: HP Laser
Reticle alignment: ISS
Reticle microscope: Variable (15 mm, 17.5 mm)
Wafer alignment: LSA, FIA
Auto focus: Single
Wafer loader: Type-1, OF Type
Flatzone: Front
In-Line exist (Right)
Cassette: Left/Right
Control rack position: Left
Reticle loader: 6" Reticle, Added library, 26 slots
PPD: Available
Barcode system: Available
Chamber type: ASAHI Chamber
No missing parts
Powered down
Deinstalled
1994 vintage.
NIKON NSR 2005 i8A is a high performance stepper, suitable for photolithography applications for microelectronic and display devices production. This stepper can be used for various applications, such as multi-layer processing, mask alignment, imaging, and more. NIKON NSR 2005I8A offers a variety of features to help improve the performance and productivity of photolithography processes. It operates at a maximum speed of four hundred and eighty-two (482) wafers per hour, and delivers high accuracy with a resolution down to 0.33 micron and an overlay accuracy of four percent (4%). The stepper utilizes a bi-focal alignment equipment with two precision-alignment objectives and a proprietary image-data precession system for improved accuracy rates. NSR-2005I8A features an optical unit with a maximum numerical aperture of 0.55 and a field diameter of four hundred and fifty-six (456) millimeters, which allows for a wide range of exposure heights and processing architectures. This machine also offers an optical catoptric design with an effective numerical aperture of 0.63 for a pure laser pre-alignment of masks. The stepper includes a micrometer arm that allows for quick and efficient wafer mounting and inspection. It is equipped with an active scanner mechanism that provides smooth and fast scanning of samples, which can handle a maximum sample size of up to 6.3" in diameter. The stepper further comes with a built-in cleanliness mapping routine, allowing users to inspect their samples for any contamination. In addition, NSR 2005 i8A has sophisticated functions like single-step writing mode and a patented automatic mask-to-mask alignment tool. NIKON NSR-2005 I8A is compatible with a variety of chemistries and resists, providing users with a wide range of choices. It is powered by a high-end software asset that offers an easy-to-use graphical user interface. Additionally, this model offers multiple options for recipe creation, which enable users to create optimized photolithography recipes for their respective application. Overall, NIKON NSR 2005 I 8 A is a highly efficient and reliable stepper for photolithography applications. It offers a wide range of features and a high degree of accuracy and efficiency, making it an ideal choice for a variety of photolithography processes.
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