Used NIKON NSR 2005 i8A #9138101 for sale
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ID: 9138101
Stepper,
PC model
NEST modify : MSC2
Software
Version : 2.4D
Reticle
(5) Size
Material : Quartz
Thickness : 0.09"
Changer type : Multi
Wafer
(6) Size
Standard : JEIDA
Orientation flat / Notch : OF
Optical system
Magnification : ( 1/5 )×
Field size : (20.0×20.4mm)
NA : ( 0.5 )~( )
Wavelength : i Line
Illumination system
Illuminant : Mercury lamp
Exposure time control : integrating Exposure control
Masking function
Wafer loader
Type : Type Ⅰ
Reticle alignment
Alignment light : Other(HeNe Laser, halogen lamp )
Type : CCD imaging, image treatment
XY stage
Type : Linear Motor Drive､triaxial interferometer
Stroke : X( 200mm )~( )/Y( 200mm )~( )
Wafer leveling
Type : Biaxial linear motor drive
TV pre-alignment
Type : Image treatment
Reticle feeder
(14 ) Sheet reticle storage
Reticle particle inspection
Type : Laser beam
Unit name : PD5(Broken)
Chamber
Cooling type (air cooling) on T/C : S85L
T/C Air cooling type : Cooling unit/inner Heater type
T/C liquid cooling type : Cooling unit/inner Heater type
T/C liquid-temp control unit : Stage
Camera
Type : CCD
FIA
LSA
Inline : Stand alone
1992 vintage.
NIKON NSR 2005 i8A is a deep ultraviolet lithography equipment designed for high-resolution production of photomasks and semiconductor chips. Featuring a large-field flat-field, 8-inch alternately stepped reduction objective lens, NIKON NSR 2005I8A is designed to support the fabrication of sub-100nm patterns. With an adjustable aperture of up to 32 microns, and an auto-focus system for fine alignment, NSR-2005I8A is capable of producing the finest of high-precision lithographic processes. NIKON NSR-2005 I8A Wafer Stepper can accelerate high-volume lithography processes, offering a maximum writing speed of up to 4 meters/second. The stepper unit supports thin resist coatings of up to 400nm, enabling a variety of otherwise difficult to achieve sub-100nm processes. Furthermore, the machine also features a multi-field and multi-axis alignment machine that eliminates the need for expensive maskset alignment. The stepper tool is complemented by a proprietary high-accuracy V-shaped stage with a mechanical encoder that can accurately measure the movement of the stage. Automated stage-scanning capabilities allow alignment of multiple fields by using parameters stored in the machine before each stepping operation. The wafer stepper is also equipped with a high-resolution Z positioner topped with an optical heater, allowing precise control of the wafer temperature. Built with a large-field flat-field, oil-immersion objective lens, NSR-2005 I8A is especially suited for large-area resists to meet the tight accuracy requirements of semiconductor processes. The oil-immersion design also makes the machine immune to vibration problems and can also be used in multi-layer resist lithography processes. NIKON NSR-2005I8A Wafer Stepper also offers a variety of innovative technologies. It supports anti-reflection coatings, advanced reticle management capabilities, fully automated operations, and a high level of process integration for efficient production. It is also backed by an array of specialized optics options, including a range of focal lengths and partial coherence variations, allowing users to make best-of-breed lithography processes with consistent and repeatable results.
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