Used NIKON NSR 207D #293591966 for sale

NIKON NSR 207D Wafer Stepper is a production-grade wafer stepper that brings reliable and high-quality circuit patterns to wafer fabrication. Its capabilities range from device fabrication to back-end production of consumer electronics. NIKON NSR 207 D is an ImTech/Ni-Plus model that incorporates advanced features such as advanced lithography, strong light exposure, fast alignment, and sensitive adjustment. For device fabrication, NSR 207D employs advanced Lithography Technology (ALT) with proprietary "Lobster Eye" lens technology. This technology allows for shorter exposure times and higher resolution images, making it ideal for 1.2 µm contact patterns for semiconductor structures. The Wafer Stepper also comes with advanced positioning and measurement systems. These systems are capable of quickly and accurately discovering the alignment error for wafer patterns to ensure higher yields during production. They also have a strong mark detection equipment that accurately detects minute defects during a single non-stop alignment process. The Wafer Stepper also has a powerful light exposure system, which ensures smooth and uniform development of photoresist. This is done by issuing a set of commands to the exposure unit and strategically mapping the exposure areas, resulting in high-quality device patterns with no hot spots and no change in the focused light intensity. For back-end production, NSR 207 D also features an exposure scanner. This has a fast alignment with a scanning speed of 100 mm/s in order to accurately control exposure. It also has an interactive item-search function to identify target patterns. This function can detect exposure drift and correct exposure errors to ensure consistent production yields. The Wafer Stepper also supports thin film processing, which can smoothly cross the wafer boundaries for production of complex patterns. To summarize, NIKON NSR 207D Wafer Stepper is an advanced production-grade wafer stepper that offers a wide range of capabilities from device fabrication to back-end production. It includes an advanced lithography machine, strong light exposure tool, fast alignment systems, sensitive adjustment, and thin filmProcessing. These features allow for high-quality device patterns and accurate positioning of wafer patterns along with consistent production yields.