Used NIKON NSR 2205 EX12B #9207018 for sale

NIKON NSR 2205 EX12B is a full-field, high-precision wafer stepper designed for exacting photolithography applications. It is designed to provide superior imaging performance and to help reduce the number of photolithography process steps required to transfer a circuit design into a wafer. NIKON NSR-2205EX12B employs a 63X high-NA lens and has an image-field rotation capability, allowing it to work with various types of patterns. It operates in a step-and-scan mode, which allows for greater flexibility in layout design and the ability to cover larger surface areas with greater resolution. Equipped with a long-life shutter and a high end, advanced laser diode equipment, NSR-2205 EX12B provides high repeatability and reliability. The accuracy of pattern transfers is also improved, enabling higher-quality devices to be produced. NSR 2205EX 12B has a high throughput, and can achieve speeds of up to 400WSPM. It is highly flexible, being able to accommodate a wide variety of substrates, including silicon, quartz, glass, metal, and polymers, as well as various circuit designs. The stepper is designed to be compatible with all NIKON systems. NIKON NSR-2205 EX 12 B is equipped with numerous features, including an auto-focus and auto-alignment feature, a die-attachment feature, a built-in lithography and resist inspection system, the ability to digitally zoom in or out, an in-place focus, and a multi-axis heater unit. The i-Line illumination machine of NIKON NSR-2205 EX12B offers wide-field lighting that helps to reduce light-induced defects. The stepper also has a dedicated tube with a quartz window and a value transfer stage that prevent contamination. To ensure accurate work, NSR 2205 EX12B is designed with a high-precision projection optical tool. It uses a high-speed X-Y stage, with a linearity of 0.1 micron and a remarkable repeatability of 0.5 micron. NSR-2205 EX 12 B is a reliable and powerful wafer stepper that offers a combination of efficiency, accuracy, flexibility, and performance. It is suitable for advanced photolithography applications, and can be used to create highly accurate components and products.