Used NIKON NSR 2205 EX12B #9379639 for sale
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NIKON NSR 2205 EX12B is a powerful and precise semiconductor wafer stepper. This machine is equiped with high performance and precise multiple-axis stages. It is suitable for creating megapixels imaging devices, precise and accurate lithography patterns, compact and efficiently packed devices in challenging small semiconductor wafer sizes. NIKON NSR-2205EX12B incorporates the latest in lithography machine technology - with miniature optical components, a die size of 25mm to 300mm and a minimum pitch size of 0.26. This advanced multiple-axis precision lithography equipment creates highly precise, patterned images on semiconductor wafers with a minimum linewidth of 0.29um. The design of NSR-2205 EX12B features include an integrated wafer handling robot equipped with isolated stages and a new ultra-high-precision optical sub-system. All components have a low-profile design making it ideal for ultra-small high resolution lithography applications. To ensure that high-resolution images are continuously generated, NSR-2205 EX 12 B utilizes a highly advanced four-point infrared laser beam scanner for long exposure times. NIKON NSR-2205 EX12B has a variety of performance-enhacing features, including a non contact air bearing stage and an advanced optical alignment unit. These features help to provide a highly reliable lithography process with maximum efficiency. Reciprocating-type slide motion and exposures precision of +/- 4 um allow NIKON NSR 2205EX 12B to produce highly accurate and uniform patterns of minimal distortion on the wafer surface. NIKON NSR 2205 EX 12B has a wide range of safety features to ensure operation safety and longevity. Multiple safety sensors monitor the machine and create an error message if an issue has been detected. Additionally, a built-in interlocks ensure protection of the machine and minimize downtime. Furthermore, advanced DIAS (Diagnostic and Intelligent Assistance Tool) provides correct data when in manual operations. In conclusion, NSR-2205EX12B is a reliable and highly precise wafer stepper supplied with a variety of features to ensure cost efficient production and excellent product quality. The advanced four-point laser beam scanning provides extremely long exposure times and a non contact air bearing stage offers high degree of accuracy of +/- 4 um. Therefore, it is an ideal machine for producing accurate and precise lithography patterns on semiconductor wafer materials.
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