Used NIKON NSR 2205 i10C #9100801 for sale
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ID: 9100801
Wafer Size: 8"
Steppers, 8"
Reticle, 6"
Applications specifications:
Resolution: 0.45 µm
Expose source: i-Line (365 nm)
Reduction: x 5
Expose field: 21.2 x 25.2 mm, 20 x 20 mm
Alignment accuracy: 0.09 µm (3 Sigma)
CD Uniformity: Max-min <= 0.04 um
Lens distortion: +/- 0.05 um
Hardware configuration:
Lens type: 5iB3S
Realignment orientation: 3:00
Wafer loader type: Type 1
Wafer type: Notched
Reticle microscope compatibility: 21.2 / 22.0 mm
Cable length: 5.0 Meters
Pellicle particle detector (Pellicle only)
Variable numerical aperture: 0.50-0.57
Selected NA: 0.50
Reticle bar code reader
Decnet
AMS
Online (OCS): NIKON SECSI / SECSII
Wafer holder: Ceramic low contact type 1
FIA
LIA
Total overlay: Up to 20 NSR's
Test reticle: R2205HA Ver.6.56 (6"-22.00 mm)
Chip leveling
Extended library
Extended wafer carrier table
Inline: Left (Nikon standard layout)
Not included:
Particle detector
Wafer edge exposure system
Multi reticle changer
SHRINC 1
Performance analysis process (PAP)
Self-measurement program (SMP)
Low particle black ceramic wafer loader fixtures
Pre alignment 2
Detector.
NIKON NSR 2205 i10C is a highly advanced and compact wafer stepper. This wafer stepper is designed for efficient and precise alignment in photolithographic production of semiconductor microprocessors. It features a fully enclosed optical equipment, a high-torque drive system, and fast scan rates, all of which make it highly efficient in its designated task. NIKON NSR-2205I10C is provided with two-dimensional alignment for accurate alignment. This includes an image sensor that captures an image from the mask, a low in-plane distortion stage with high resolution for leveling and low irregularity at the highest scanning speeds, and a high input accuracy that ensures smooth and accurate segment rotation. The crystalline focal plane delivers a wide field of view and superior depth of focus to match the lithography environment, protecting the wafer's fragile pattern during scanning. NSR 2205 i10C uses a high-torque drive unit to align the wafer with high speed and precision. This is provided by a combination of two types of motors: Brushless Direct Coupled Motors (BDM) and Slitless Stepper Motors (SSM). The BDM provides high position resolution and smooth movement with low vibration, while the SSM provides high speed and uninterrupted position control. Through the combination of these two motors, NSR-2205I10C ensures the precise alignment of the wafer even at high scan rates. NIKON NSR 2205 i10C also features a microstage and flying-spot laser alignment machine. This enhances the precision of the alignment by allowing for the fine adjustment of the wafer's position. This tool is capable of quickly detecting and correcting any misalignments, ensuring a successful lithographic process. NIKON NSR-2205I10C is designed to provide a safe and cost-effective means of aligning and positioning wafers in photolithographic production. This asset is designed to achieve alignment precision up to 0.3 µm, and as a result of its efficient design and precise alignment capabilities, it is capable of supporting increased throughput in complex production environments.
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