Used NIKON NSR 2205 i12 #293594921 for sale

NIKON NSR 2205 i12 Wafer Stepper is a high-performance lithography system designed for high-volume production of microelectronic devices. It utilizes a 12" Scanning Platform which is capable of supplying up to 15W of light energy to develop high-resolution patterns on the wafer surface. It is equipped with a laser alignment system which allows for precise and repeatable patterning of single to quadric pattern layers. NIKON stepper also incorporates a fully automated, 14-axis motion control system, allowing for rapid and accurate fine-tuning of pattern alignment and focus. NSR 2205 i12 achieves unparalleled resolution and accuracy, due to its utilization of NIKON Scanning Platform. The Scanning Platform utilizes a unique combination of hardware, optics and advanced microelectronic technologies to deliver laser energy for wafer stepper lithography. The Scanning Platform is highly efficient, providing up to 4,000 exposures in one hour of processing. This high throughput allows for high-yield production of advanced microelectronic devices. NIKON NSR 2205 i12 also features a variety of image processing technologies, including advanced focus control, auto-focus and distortion correction. These technologies ensure that microelectronic patterns are accurately printed on the wafer. Additionally, this equipment features advanced productivity monitoring features. These features allow process engineers to monitor wafer production and make necessary adjustments to improve yields. NSR 2205 i12 is also easy to maintain and upgrade. The optics and wafer stepper components can be quickly replaced, and the software can be easily updated. All key components and parts of the equipment are easily accessible, making maintenance and upgrade operations simple and convenient. In conclusion, NIKON NSR 2205 is a high-resolution, cost-effective package for the development of microelectronic devices. Highly efficient and built for high-volume production, this wafer stepper is a comprehensive solution for lithography applications. Furthermore, it is easy to maintain and upgrade, allowing for a worry-free production process.