Used NIKON NSR 2205 i12D #9263044 for sale
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ID: 9263044
Wafer Size: 8"
Vintage: 1997
i-Line stepper, 8"
Chamber type: ASAHI
Reticle size, 6"
Reticle microscope: Fixed
Maximum field size: 22 x 22
Extender library: Left to right
Reticle barcode reader
Reticle case, 6"
Reticle SMIF
Lens uniformity: 3.110%
Illumination average: 726.748 mW/cm2
Wafer chuck: Ring
Pre alignment 2: Notch, 8"
Wafer loader: Type 3
Chip leveling
Left in-line
Wafer carrier table: Left / Right
Alignment sensor: LSA / FIA
Normal rack type
SHRINC: Type 3
1997 vintage.
NIKON NSR 2205 i12D is a high-performance wafer stepper designed for advanced processes in semiconductor device fabrication. It is a state-of-the-art scanning stepper equipment supporting resolutions of up to 0.25 µm as well as a high speed and accurate scanning capability. The wafer stepper is designed to be used with the latest lithography tools, such as immersion lenses, and is configured with an array of cutting-edge technologies to provide reliable, high-precision production. NIKON NSR-2205I12D is powered by a highly accurate 12-beam, variable shaped beam (VSB) lithography system. This unit offers improved precision and variable focus control, providing stability and reliability for demanding applications. The 12-beam configuration also ensures superior photomask fabrication, reducing contamination and ensuring consistent fidelity with finished devices. The stepper also features the latest in active alignment sensing and correction technology to ensure the highest quality alignment and overlay accuracy, minimizing device-to-device variation. At the heart of NSR-2205I 12D is a powerful control machine which is highly configurable and offers a wide range of lithography, imaging, computing and synchronization functions. This control tool automates many of the necessary processes which are used during device fabrication, eliminating the need for tedious manual inspection and adjusting, helping to streamline production processes and ultimately reduce costs. The Advanced Leveling Stages (ALS) has been specially designed for NSR-2205I12D, to ensure fast and smooth operation of the stepper asset. This low profile, dual-rail, air-bearing stage is extremely stable, and is adjustable to 1µm accuracy. The ALS model is easy to use and allows for many magnetically driven stages to be interconnected for complex movements and motions. NSR 2205 I12 D also features EI lens technology, as well as Reflective Imaging by Characterization (RIC) imaging which eliminates the need for additional alignment and overlay wiring and improves accuracy compared to conventional lens systems. The wafer stepper also supports a wide range of advanced processes, including mask writing and process control. Overall, NIKON NSR 2205 I12 D is an advanced scanning stepper equipment designed to provide groundbreaking performance and reliable fabrication. With the combination of its cutting-edge technologies and powerful control system, the stepper is an excellent choice for any cutting-edge semiconductor device fabrication.
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