Used NIKON NSR FX-601F #9293644 for sale

NIKON NSR FX-601F is a high-performance wafer stepper that offers an exceptionally precise and efficient solution for all levels of lithography applications. This versatile tool is capable of working at an impressive speed of 0.9 second exposure time and can support all types of substrates from submicron patterns to extreme precision features. It is equipped with a highly sophisticated laser-based projection optics equipment that offers an unmatched high-level of focus and accuracy, eliminating potential aberrations commonly associated with conventional steppers. NIKON NSR FX 601 F's extremely fast repeatability rate ensures that the system's optical performance can maintain its unparalleled precision no matter how complex or precise the pattern is. Additionally, the stepper is designed to generate accurate exposures of patterns with resolutions as low as 20nm. The stepper's advanced automation capabilities allow it to be quickly reconfigured for any photomask to obtain the highest level of accuracy with minimal operator training and time. NSR FX-601F also offers highly advanced touch screen functions to further facilitate user operation. This unit gives the user the flexibility to easily access and modify machine functions such as exposure accuracy and intensity. In addition, the stepper is equipped with an intuitive programmable interface that allows it to integrate with various front-end tools, such as exposure data acquisition software, to further improve lithographic performance and stability. NSR FX 601 F offers users exceptional value, ultimately enabling the highest degree of performance and accuracy while allowing for fast cycle times. It offers superior quality and reliability even in the most challenging exposure scenarios. The highly sophisticated design ensures that the stepper consistently delivers high-precision results with the utmost consistency. Overall, this provides users with a powerful and reliable wafer stepper capable of meeting the needs of any size lithography application.