Used NIKON NSR S202 #9299398 for sale

NIKON NSR S202 is a precision lithography equipment designed to provide a high level of accuracy in the production of semiconductor devices. It is a dual-field wafer stepper that incorporates superior optics and motion control to ensure image fidelity and geometrical accuracy. The system is equipped with a high-precision, wide-band galvo scan mirror that provides simultaneous field exposures while maintaining image resolution during the exposure process. The off-axis illumination design of NSR S202 combines diffused illumination and polarized light control to achieve optimal exposure uniformity across the stepper field size. A telecentric zoom lens is used to maintain a flat focal plane over a larger semiconductor device feature size, with no zooming errors or aberrations. NIKON NSR S202's advanced motion unit offers a variety of scanning modes, including 5×5, 4×4 and 3×3 field sizes, along with fine adjustment of velocities and acceleration for precise control. Its precise alignment machine ensures alignment accuracy and repeatability, and the lens-to-wafer height and position control are set by a high-precision XY raster stage. NSR S202 includes an array of process control features to ensure repeatable and defect-free processing. It is equipped with NIKON patented Photo Monitoring Tool, which offers direct pattern observation during the stepper exposure process, and automatic defect detection and correction capabilities are provided by NIKON ZyGo Sensor process control toolset. In addition, NIKON NSR S202 is equipped with a dual-wavelength laser mark detection asset that enables defect registration and inspection. Its advanced debris management model is designed to minimize the contamination of wafers by collecting debris in an easy-to-access tray. Overall, NSR S202 is an advanced dual-field wafer stepper that offers a combination of superior optics, motion control and process control features to ensure the highest output of accurate and defect-free semiconductor devices.