Used NIKON NSR SF200 #9220471 for sale
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ID: 9220471
Wafer Size: 6"
KrF Stepper, 6"
Resolution: 150 nm
Handedness: Inline left or right
Altitude: Varies by site
Chamber type: Standard
Variable numerical aperture: Maximum 0.63
sPURE
RET Apertures iNA: 0.50, 0.38, 0.24, 0.19, 0.12, 0.38
Quick reticle change (QRC)
Reticle size: 6"
Field image alignment system (FIA)
Laser step alignment system (LSA)
Phase contrast FIA
TTLFC2
Pre-alignment 2
Wafer stage: Air bearing / Linear motors
Ceramic wafer holder
Wafer loader
Chip leveling included
Multipoint focus/level
NIKON SECS II GEM Interface
GIGAPHOTON KrF Excimer laser source
Options:
Resolution enhancement technology (RET)
Reticle barcode reader
Extended wafer carrier table
Pellicle particle detector
2003-2004 vintage.
NIKON NSR SF200 is a high-end wafer stepper equipment, designed for the production of semiconductors, MEMS, and MOEMS. It offers diverse optical capabilities and a wide field of view, making it ideal for complex lithography processes. NIKON NSR SF 200 is equipped with a scanner-type reduction projection lens and an ultra-high resolution alignment sensor. The scanner-type reduction projection lens utilizing NIKON proprietary optical design, delivers numerical apertures (NA) of 0.55 to 0.75, providing high-resolution 2580 dpi with a 5 μm electromagnetic field Generator (FEG). This enables excellent image uniformity and resolution on wafers, even when working with highly complex structures. The system is also equipped with NIKON Double Movable Proximity Stage (DMPS) and defect Inspection algorithm, which enable highly precise alignment of wafers and lithography masks. The DMPS technology eliminates stitching problems between wafer and mask levels, offering highly accurate lithography processes. Additionally, the Defect Inspection algorithm allows for scanning of wafers during lithography production, monitoring for irregularities and faults to aid in defect proofing. NSR SF200 features NIKON proprietary process control unit, offering user-friendly operation, advanced process information tracking, and real-time debugging. The process control machine optimises patterns, exposure parameters, turning timings, and focal points, ensuring the best lithography results. Additionally, NSR SF 200 is equipped with an air-cooling tool, offering stable operation and improved thermal uniformity. It also provides Smart Recipe Master software, which allows users to create and store their own recipes, as well as share recipes with other users. In conclusion, NIKON NSR SF200 is a robust, versatile, and user-friendly wafer stepper asset, designed to meet the needs of modern semiconductor manufacturing capabilities, with a host of optical and process control features.
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