Used NIKON S 207 #293660439 for sale

NIKON S 207 Wafer Stepper is a fully automated and high-end wafer stepper that combines high-precision alignment capability with high throughput and wafer-to-wafer overlay accuracy. It is a fully programmable equipment with a range of modules that can be used for stepper processes, including PEB, LPCVD, EPI, and other in-line techniques. The system features a large exposure field of 10.7 nm by 10.8 nm, high numerical aperture (NA) of 0.75 and a high stepper speed of 300 frames per second. The stepper has two exposure heads, each with an independent optical unit, which are configurable for different exposures and wafer types. The optical parameters can be programmed to optimize the imaging machine for exposure at different numerical apertures, depth of field, magnification, and lithography pattern size. The tool's alignment asset includes auto alignment optics, large field of view, and sub-nanometer resolution for accurate and repeatable alignment of critical layers. The model also features an integrated laser-assisted wafer alignment equipment for extreme accuracy. NIKON S207 Wafer Stepper has a comprehensive image processing system for advanced photolithography features such as small pattern stitching, distortion compensation, color separation, and hi-Q imaging. The unit allows for up to 3 exposures per second for high throughput. It supports full exchange of exposure field between exposure heads, allowing for high redundancy and utilization of expensive wafers. S 207 Wafer Stepper also features an extensive patterning library for easy setting up of patterning parameters, providing maximum pattern control for users. The user-friendly interface is easy to use, and allows for management of different layers and wafer definitions. The machine is ETTO compliant, and meets up to the most stringent lithography process requirements. S207 Wafer Stepper offers one of the most comprehensive systems for precision lithography, imaging, and wafer quality control. Its large exposure field, fast speed, and high-quality resolution make it the ideal solution for production of complex 3D displays, medical devices, semiconductors, and other advanced applications.