Used SCIVAX Flan-200-U100-4 #9209082 for sale

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SCIVAX Flan-200-U100-4
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ID: 9209082
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SCIVAX Flan-200-U100-4 is a specialized wafer stepper used in the production of semiconductor components. It is a versatile machine capable of producing high-precision, high-performance patterns in a variety of materials. The machine features a 200 mm, four-inch wafer stage and is rated up to 100 Watts of power. The layer-to-layer accuracy is within 1 micrometer, and the stepper offers high-resolution capability down to 0.4 micrometer. The machine is designed to make precise micro-level features and patterns on wafers or substrate layers. It is also capable of patterning high-aspect-ratio structures. It is equipped with an image amplifier that helps ensure accurate positioning and navigation of the wafer during processing. The optics system is designed for high-speed scanning with sub-micron accuracy. The machine utilizes a variable shape-zone plate (VZP) imaging system for maximum overlay accuracy. The stepper is well-suited for a wide variety of applications, ranging from MEMS device fabrication to semiconductor device packaging and substrate routing. It is capable of working with a variety of materials, including polymers, metals, and ceramic. It performs well with both thin and thick films and has built-in support for dry etching. The stepper has a maximum pattern size of 200 x 200 mm, a maximum exposure rate of 0.4 micrometer/sec, and a maximum resolution of 0.2 micrometer. The stepper features a number of advanced analytical tools, including a defect inspection tool for spot sizing and detectability. The image intensity tool ensures that the image is accurate and noise-free. Additionally, the stepper has an automated calibration feature that helps maintain the machine's precision over time. Flan-200-U100-4 is an advanced wafer stepper that is capable of producing a wide variety of precise micro-level patterns on a range of materials. It is well-suited for many semiconductor production requirements and offers excellent accuracy and performance.
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