Used ULTRATECH 1100 #130601 for sale

ULTRATECH 1100 is a state-of-the-art wafer stepper manufactured by Mapper Lithography. This automated photolithographic machine is able to accurately etch precision patterns onto semiconductor substrates with feature sizes ranging from 0.5μm down to a few nanometers. With technology based on Meta "Ultrafast" liquid immersion lithography, 1100 is able to achieve such detail by projecting light through an immersed immersed projection lens. This lens is capable of projecting an evenly focused beam across a wide field of view. The scanning system in ULTRATECH 1100 is designed to follow a Cartesian path, and can reach speeds of up to 2000mm/s with a repeatable accuracy of ±3μm. The scanning machine additionally incorporates dynamic aspect correction which ensures that the projected pattern is accurately represented, regardless of the substrate size. 1100 is equipped with a large reconfigurable mask plate and offers two imaging modes: one photomask mode and one digital pattern generator mode. The photomask mode enables the user to upload a photomask layout onto the machine and the imaging will accurately follow that design. In the digital mode, imaging is done on the fly, allowing for the production of complex geometries design on the fly. ULTRATECH 1100 additionally supports a wide range of coating and etching materials to enable accurate patterning of a variety of substrates. Specifically, it supports photoresists such as SU-8, Polyimide and BCB as well as dry etching materials such as Silicon Tungsten, SiO2 and Si3N4. 1100 has a 10MP CMOS camera for high resolution imaging, allowing users to check the process results in real time. The camera can also be used to perform inline OCR and defect inspections. Overall, ULTRATECH 1100 is an ideal stepper for semiconductor research and high production, due to its precision imaging capabilities, reconfigurable mask plate, wide range of coating and etching materials, fast scanning and dynamic aspect correction.