Used KLA / TENCOR ASET F5x #9300883 for sale

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ID: 9300883
Film thickness measurement system.
KLA / TENCOR ASET F5x is a wafer testing and metrology equipment used for the accurate analysis and measurement of semiconductor features on wafers. Specifically, the system uses advanced imaging and pattern recognition technology to detect, measure, and evaluate small dimensional features on semiconductor wafer surfaces in order to ensure high quality and accuracy in production. The unit consists of a number of individual components, including an optical microscopy station, a sample motion station, a comprehensive image, and interferometry-based metrology laboratory, and an automated method development and verification machine. The optical microscopy station within KLA ASET-F5X utilizes adaptive optics to enhance the contrast and resolution of manufactured features and optimize the captured image quality. From the high definition images generated with this station, a computer tool utilizes advanced pattern recognition technology to identify, measure, and analyze key characteristics of small semiconductor features. The sample motion station of the asset provides accurate motion control to ensure proper wafer alignment, high efficiency, and repeatability for testing across different locations. In addition, this station also allows the model to perform quick non-contact surface feature measurement. The comprehensive image metrology laboratory provides precision-based dimensional measurement of prominent line and pitch features on the wafer. This includes the ability to characterize both local line features, including bridging, width and height, as well as global line features such as step height and line width uniformity. The automated method development and verification equipment helps to ensure accuracy and repeatability throughout the testing process. This is done through the integration of advanced optics and computation intelligence to quickly assess and react to feature errors. Furthermore, TENCOR ASET F 5 X also provides a variety of optional modules and packages to further enhance its metrology capabilities for customized solutions. These include modules for widefield imaging, high resolution inspection, critical dimension measurement, and defect inspection. In conclusion, KLA ASET F5x is a comprehensive wafer testing and metrology system that uses advanced imaging and pattern recognition technology to detect and measure small semiconductor features on wafers in order to ensure high quality and accuracy in production. With a wide range of optional modules and packages to choose from, the unit is adaptable for usage in various industries.
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