Used KLA / TENCOR SP1-DLS #9256586 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

ID: 9256586
Wafer Size: 12"
Vintage: 2004
Unpatterned surface inspection system, 12" With (2) ASYST IsoPorts Edge handling Loader type: Dual FIMS, 12" BSIM (Flipper and ECWA) Robot BF Laser 2004 vintage.
KLA / TENCOR SP1-DLS is an innovative mask and wafer inspection equipment designed to bring improved resolution, increased throughput, and superior defect detection and analysis for the semiconductor industry. The new system helps customers stay competitive by providing faster time-to-market and facilitating more efficient operations. KLA SP1 DLS is a dual-sided wafer and mask inspection tool. It features best-in-class, 5x resolution imaging, high-speed throughput, and proprietary Zone-Based Analysis technology. The unit enables customers to quickly and accurately detect defects on the device or mask levels with 4nm resolution in both brightfield and darkfield imaging modes. TENCOR SP 1-DLS consists of two major elements: a multi-headed optical machine and its proprietary Real Time Iterative Review (RITR) algorithm. The optical tool is comprised of 13 independently moveable detector heads featuring unique optics and sensor designs to acquire the most accurate data in the shortest possible time. It also includes optical elements and high-resolution cameras with a broad field of view to detect very small defects. Meanwhile, the RITR algorithm provides customers with revolutionary levels of accuracy and throughput. This algorithm integrates defect detection, classification, and analysis into a simultaneous two-way process, helping customers detect even the most difficult-to-find defects. Moreover, SP1 DLS is the only dual-sided asset with advanced Defect Review Iterations (DRI), a new technology that takes defect review to the next level. DRI allows users to quickly apply multiple sets of parameters to the same sample, making it easier to diagnose and correct any defects found in a fraction of the time. This model also includes image enhancement and data mining capabilities, giving customers invaluable insight into the overall structural integrity of their designs. Overall, TENCOR SP 1 DLS is a powerful and reliable mask and wafer inspection equipment that helps customers save time and money, stay competitive, and enjoy superior defect detection and analysis. It provides high-quality imaging and high-speed throughput for faster time-to-market, and its advanced technologies ensure the accuracy and reliability of the resulting results.
There are no reviews yet