Used DNS / DAINIPPON SU-3100 #9129361 for sale

DNS / DAINIPPON SU-3100 Wet Station is an advanced DMA station used for high-performance nanotechnology research and electronic device design. The station is equipped with a multi-layer lithography equipment and an array of advanced processes such as atomic layer deposition, reactive-ion etching, chemical vapor deposition, plasma- enhanced chemical vapor deposition, and sputtering. It is capable of patterning metals, polymers, and dielectrics with high precision and resolution. The station utilizes a laser direct imaging (LDI) system for precise mask alignment. The unit uses a precision micro focus diode laser with a power of 6 W and an intensity of up to 50 mW/cm2 to project a mask that can be accurately aligned to the desired pattern. The XY closed-loop motor allows for high accuracy and precision alignment. The LDI machine can achieve resolutions up to 250 nanometers and can accommodate a range of mask sizes up to 600 x 600 mm. The wet station also utilizes a multi-layer lithography process to fabricate integrated circuits. Its scanning electron beam implements the patterning of nanometer-scale features on the surface of a substrate with precision and resolution. This is done by first applying a resist mask to the substrate and then laser-direct imaging the mask onto the substrate. The tool then uses a combination of either reactive ion etching or chemical vapor deposition methods to transfer the pattern from the mask onto the substrate. The station also contains several contaminant removal systems that are able to maintain the purity of the process environment. An effortless liquid circulation desmear and minifluid cooler are utilized before processing in order to decrease the chances of particles from entering the process. The station has a built-in asset for filtration and recirculation of the fluid used in the wet processes, as well as an ozone removal model and cryo-recirculation equipment with a 0.2 µm filter. These systems help prevent contamination of the processed substrate and increase the reliability and lifetime of the device. DNS SU-3100 Wet Station is an advanced station for nanofabrication and device design. It provides a sophisticated platform for research and development due to its high precision and resolution, contamination removal systems, and multi-layer lithography options.