Used AMAT / APPLIED MATERIALS P5000 #190251 for sale

AMAT / APPLIED MATERIALS P5000 reactor is a revolutionary equipment designed to help with semiconductor manufacturing processes. It is a 20 kW plasma system designed for substrate sizes up to 405 mm and is capable of delivering a range of high-density plasma processes. It has a high degree of automation, with an integrated control and user interface, making operation simpler and more efficient. The unit consists of four major components: the plasma chamber, the discharge chamber, the electronic control and the power supply. The plasma chamber is made of high-grade aluminum with a bottom insulating layer to minimize heat transfer. Its shape is designed for uniform plasma density and distribution, offering both increased accuracy and repeatability of the process. The discharge chamber is designed with a single-sided gas inlet to reduce operational complexity and improve uniformity of the grow/deposition rates. AMAT P-5000's advanced power converter supplies full and uniform power to the coil, providing accurate and repeatable results and ensuring that the substrate temperature is well controlled. The machine also features a high-performance control layer, with user-friendly operator interface and control logic, that allows operators to program recipes, parameters and processes quickly and accurately. APPLIED MATERIALS P 5000 reactor provides excellent performance, productivity and repeatability in semiconductor processing. Its efficient power delivery and uniform plasma distribution helps ensure consistent results. The advanced user interface makes operation simple and efficient, and the consistent results offer both cost savings and increased quality. APPLIED MATERIALS P5000 is an ideal solution for semiconductor manufacturing.