Used TEL / TOKYO ELECTRON Alpha 8S #190768 for sale

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ID: 190768
Wafer Size: 8"
Vintage: 2000
Diffusion furnace, 8" Specifications: - AP-FTP oxidation current configuration (Tunnel Ox) - “Thin” oxide - Atmospheric torch - 50 production wafers load size - Boat rotation - H2 detection and digital gas monitor - 72.4 KVA transformers Gas System - House N2 2x - UHP N2 (cylinder) 1x - Argon - O2 - H2 - HCl General - Wafer type: Notch type - Signal tower: 3 color (RYG) - I/O Type - AGV compatibility: none - Rapid cooling unit: use - Load lock system: None - Production wafer qty: max 150 wafer/batch Controller and Software - HD version: WAVES V2.48 R007[S801FE-0005] - Release date: 2006/6/27 - HDD Capacity: 4.3 GB Power - Heater: 50/60Hz, 480V, 3Ph - Controller: 50/60Hz, 208V, 1Ph - Pump: none Controllers - Main system controller: WAVES, with back remote - Temperature controller: Model-560 - Pressure controller: Model-none - Mecha controller: T-BAWL - Burn controller: HEC Pyro controller - MFC controller: Model-none MFC1 Tylan Ar 30SLM MFC2 Tylan O2 10SLM MFC3 Tylan O2 30SLM MFC4 Tylan O2 10SLM MFC5 Tylan O2 3SLM MFC6 Tylan H2 10SLM MFC7 Tylan H2 3SLM MFC8 Tylan HCl 3SLM MFC9 Tylan N2 30SLM 2000 vintage.
TEL / TOKYO ELECTRON Alpha 8S is a advanced diffusion furnace designed to provide an enhanced level of control and precision in high temperature processes. It features highly durable design and construction, with an advanced power supply and controller, allowing for the accurate results with multiple substrate sizes and shapes. TEL ALPHA-8S provides superior temperature uniformity, making it ideal for use in semiconductor fabrication processes, such as oxide deposition, or for device prototyping, including MEMS/NEMS. The key feature of TOKYO ELECTRON ALPHA 8 S is its Dual Hot Zone equipment, which provides two heating elements that are independently adjustable for maximum performance and temperature uniformity. The temperature of each heating zone can be precisely controlled and monitored, enabling precise and repeatable process results. The hot zone is enclosed within an inert atmosphere, providing a stable thermal environment within the furnace chamber that prevents contamination and oxidation. TEL / TOKYO ELECTRON ALPHA-8S features a programmable end-of-run shut off, which ensures that the system will stop the process when the desired result is achieved. It also has an advanced pneumatic handling unit, which securely holds the substrates during processing, allowing a fast and reliable operation. The lid of the furnace can be removed for easy access to the substrates, and features safety edge protection to avoid accidental contact with hot surfaces. ALPHA-8 S is also equipped with a powerful control machine, allowing for single-point computer control over the entire process. With the built-in Japan Modular Auto Programming software, users can easily program any of the advanced processing options and settings. TOKYO ELECTRON ALPHA-8 S also includes an automated wafer transfer station, which provides wafer handling and fetching capabilities to improve throughput and repeatability. It is suitable for both full wafers and small pieces, allowing for efficient and reliable transfer of the substrates. Additionally, ALPHA-8S is available with a wide range of advanced accessories, including gas injection systems, gas header, pumping systems, and process monitors. These accessories allow for a comprehensive process control and provide greater control over the diffusion process. In summary, TEL Alpha 8S is an advanced diffusion furnace designed specifically to deliver superior process control and performance. It features a host of features and accessories to ensure efficient and reliable operation.
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