Used DAINIPPON MP-2000 #190876 for sale

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DAINIPPON MP-2000
Sold
Manufacturer
DAINIPPON
Model
MP-2000
ID: 190876
Spin processor (2) chambers 2000 vintage.
DAINIPPON MP-2000 is a photoresist equipment used in the photolithography process when creating semiconductor devices. The system facilitates the selective filtration of light within the photolithography process, allowing the desired areas of a masking design to be exposed to light and transferred onto the wafer. This process is used to create a patterned surface on the wafer, later used for etching and other processing. MP-2000 unit uses a combination of a highly reflective aluminum mirror and negative or positive photoresist to reflect light off the wafer with a consistent wavelength throughout the area. This allows the chosen areas of the wafer to experience reflectance while the rest of the surface remains unprotected. The masking design is printed onto the photoresist material, and then it is exposed to the light incidence fields. The designed areas are exposed to light and cured, while the areas outside the mask are protected from the light. This process is repeated over the whole wafer with all the masking designs necessary. The aluminum mirror in DAINIPPON MP-2000 machine is highly reflective and durable. It is a highly resistive material that is capable of providing rapid illumination within the process. This also reduces the amount of energy used, thus reducing the amount of power necessary to run the tool. The mirror also helps in providing a consistently regulated environment within the photoresist asset. MP-2000 model also uses a negative or positive photoresist to allow the desired areas to be exposed to the light, while the rest of the wafer is protected. The photoresist is a liquid material that can be combined with a suitable medium (such as a spun-on film or polymer) that forms a mask much like a etched pattern. When exposed to light, the molecules within the photoresist break down, allowing the design of the mask to be transferred. Photoresist systems are an essential part of photolithography and DAINIPPON MP-2000 provides a highly durable and reliable equipment for selective light filtration for the wafer. Its reflective aluminum mirror is highly efficient in providing rapid illumination and the negative or positive photoresist allows for the desired areas to be protected from the light incidence fields, creating the perfect photolithography environment.
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