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1852 RESULTS FOUND FOR: used Ion Implanters & Monitors

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    APPLIED MATERIALS 9500xR Ion implanter.
  • AIBT / ADVANCED ION BEAM TECHNOLOGY: ISTAR

    AIBT / ADVANCED ION BEAM TECHNOLOGY iStar Ion implanter Asyst IsoPort 9700-9129-01 Rev. E Wafer Loader Asyst Teach Pendant (3) Asyst Fan/Filter Assemblies Asyst 14001-003 1515mm Linear Positioning Track Copley 8001052 Amplifier/Driver Ion Systems 5024 Controller with five 5285E Aerobar Ionizers Includes some manuals and software disks Missing: (3) Asyst IsoPort Loaders Wafer Robot Prealigner.
  • AMAT / APPLIED MATERIALS: QUANTUM III LEAP

    APPLIED MATERIALS Quantum III LEAP Ultra low energy implanter, parts system.
  • AMAT / APPLIED MATERIALS: QUANTUM III

    APPLIED MATERIALS Quantum III Ultra low energy implanter, 8".
  • AMAT / APPLIED MATERIALS: QUANTUM X

    APPLIED MATERIALS Quantum X High current ion implanter, 8" Can be retrofitted as a 12" unit Application: High current Wafer shape: SNNF Energy: LEAP Ultra low (0.2-80KeV) Toxic exhaust: Top Utilities entry: Bottom Water fittings: Metric Enclosure exhaust fans: no Distance remote: 15 meter Configurable signal tower: Standard Turbo pumps: Seiko Seiki on beamline (3) Cryo pumps Alcatel iPUPs Hiden RGA Loadport stations: 3 Loadport station type: Applied door openers (ADO) End-effector typE: Low backside particle Vac Processor enclosure doors: no Ion source Ultralife III Source Tungsten G1 Front plate on all sources Vaporizers: no Gas panel box: Unit MFCs for Argon (inert and PFS) TEM: yes Gas Panel One: Position 1 Process gas BF3 Gas delivery system SDS MFC Selection: Unit 1662 Bottle fitting: BF3 (VCR) Bottle support 40-110MM Second bottle support: No Gas Panel Two: Position 2 Process Gas None Gas Panel Three: Position 3 Process gas AsH3 Gas delivery system SDS MFC Selection: Unit 1662 Bottle fitting: AsH3/PH3 (VCR) Bottle support 40-110MM Second bottle support: No Gas Panel Four: Position 4 Process gas PH3 Gas delivery system SDS MFC Selection: Unit 1662 Bottle fitting: AsH3/PH3 (VCR) Bottle support 40-110MM Second bottle support: No Gas Panel Five: Position 5 Process gas None Gas Panel Six: Position 6 Process gas None Manual eDocs CD Cleanroom paper manual Qualifications failed after Etest parameter OOS Poly 2 Currently located in a fab, powered on and can be inspected, idle 2004 vintage.
  • AMAT / APPLIED MATERIALS: 9500XR

    APPLIED MATERIALS 9500xR Implanter, 8" Direct drive 1995 vintage.
  • AMAT / APPLIED MATERIALS: 9500XR

    APPLIED MATERIALS 9500xR Implanter Direct drive 1995 vintage.
  • AMAT / APPLIED MATERIALS: XR200S

    APPLIED MATERIALS XR200S Implanter, 5" 208 V, 3 phase, 50/60 Hz Max con. power: 65 kVA Max con running current: 180 A Circuit breaker: 250 A Single largest load: 90 A (beamline Iso Tx) Interrupt capacity: 65000 A 2001 vintage.
  • AMAT / APPLIED MATERIALS: QUANTUM LEAP III

    APPLIED MATERIALS Quantum Leap III Ion implanter End station: Brooks ABM 405, 4 stations Vacuum: (2) CTI OB-10, (1) STP1303CV3, (1) STP451C, (1) BOC QDP 40 Cooling system: Water cooling, SWEP B35MX3P/1P-SC heat exchanger Operation interface & software: V4.17 Transfer Arm: 200mm Wheel Type (Si coating): 200mm Implant angle: Automatic, recipe-controlled +/- 10 degree Energy capacity: 0-80KV (45KV for Sb+) Beam current capacity: Up to 25mA, subject to species and energy. Unniformity: 1s ? 0.5% Particle Control: < 0.1 added per cm2 with > 0.16um particles Metal contamination: Al <1E12 atoms/cm2 for doses <5E15 atoms/cm2 Energy contamination: < 0.5% or 100V, whichever is larger Temerature Check: <100 degree Species Resolution: M/?M>80 Gas bottle type: (4) SDS In-vac wafer handling: (1) 0011-92528 Wheel assembly 200mm (17) Clip assy (17) Fix restraint (17) 0011-00989I Sensor assy PW (1) 0011-93088 Assy.WOHS sensor (1) 0011-01034 Clip actuator assy (1) Wheel hard stop (1) 0011-92491 Gripper arm assy 200mm (1) Gripper cylinder (17) 0040-07593 Heatsink (1) 0020-6905 Blade arm assy (1) 1193219 Blade assy In-air wafer handling: (1) 0230-00286 Dummy cassette (2) 0045-90713 Dedicated casssette Control circuit: (1) 0130-01041 Gripper PCB.
  • AMAT / APPLIED MATERIALS: 9500XR

    APPLIED MATERIALS PI 9500xR High current ion implanter, 8", 1996 vintage.
  • AMAT / APPLIED MATERIALS: XR200S

    APPLIED MATERIALS XR200S Implanter, 5" 208 V, 3 phase, 50/60 Hz Max con. power: 65 kVA Max con running current: 180 A Circuit breaker: 250 A Single largest load: 90 A (beamline Iso Tx) Interrupt capacity: 65000 A 2001 vintage.
  • AMAT / APPLIED MATERIALS: XR120

    APPLIED MATERIALS xR 120 High current implanter, 8" Handling SMIF Pumps: QDP40 & QDP80, EH500 Cryo compressor: CTI 9600 Source: Bernas 1997 vintage.
  • AMAT / APPLIED MATERIALS: QUANTUM II LEAP

    APPLIED MATERIALS Quantum II Leap High current ion implanter, 12" Rough pumps: Edwards Turbo pumps: Leybold 340M and MAG W 1500C 6-Position Gas Panel: BF3(SDS), nil, AsH3(SDS), PH3 (SDS), Xe(HP), N2 Standard Gripper Beam-off- Vacuum: Source 4e-8, MRS 2.6e-7, Chamber 3.3e-6 Wheel vibration sensor: 1.6 mm/s mean average Software version 4.17.00 Beta, PMAC 1-16C Currently installed 2003 vintage.
  • AMAT / APPLIED MATERIALS: QUANTUM 2

    APPLIED MATERIALS Quantum 2 Implantation high current, 12". APPLIED MATERIALS Quantum implanter.
  • AMAT / APPLIED MATERIALS: QUANTUM 2

    APPLIED MATERIALS Quantum 2 High Current Ion Implanter, 12".
  • AMAT / APPLIED MATERIALS: XR120

    APPLIED MATERIALS xR 120 High current implanter, 8" BF3, AsH3, PH3 1998 vintage.
  • AMAT / APPLIED MATERIALS: XR80 LEAP

    APPLIED MATERIALS 80xR Leap Implanter, 8" 80 keV IHC Style.
  • AMAT / APPLIED MATERIALS: 9500XR

    APPLIED MATERIALS 9500xR Ion implanter Missing parts Currently installed.
  • AMAT / APPLIED MATERIALS: XR80

    APPLIED MATERIALS xR80 High current ion implanter, 8" Tool status: Warm shutdown Software version: 4.13.05 CIM Linked Hardware configuration: (1) Xr-Leap implanter (1) Heat exchanger Hardware configuration: (1) GRC System (1) Heat exchanger Hard disk: 4 GB RAM: 128 MB Cooling system: Heat exchanger / Closed loop de-ionized water cooling system Wafer loader: (3) Carousel paddles Wafer orienter: Batch notch orient Wheel chamber: (17) Heatsinks (200 mm) Control system: Fibre optic communication network (DAQs) Control module: VME Microprocessor Plasma flood gun: PFS (Plasma flood system) Beamline: IHC (Indirect heated cathode) Gas panel option: SDS (Safe Delivery System) toxic gas modules: AsH3 and PH31 High pressure toxic gas module: BF3 Tilt: Variable implant angle, +/- 7º Source bushing: Enhanced Currently deinstalled 1997 vintage.
  • AMAT / APPLIED MATERIALS: XR200S

    APPLIED MATERIALS xR200S Ion implanter Cassette to cassette Power requirements: 208 V, 180 A, 50/60 Hz, 3 Phase CE Marked 1999 vintage.
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