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395 RESULTS FOUND FOR: used Ion Milling

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  • ALTURA / FEI: 855

    ALTURA / FEI 855 Focused Ion Beam Scanning Electron Microscope (FIB-SEM) 2005 vintage.
  • ALTURA / FEI: 855

    ALTURA / FEI 855 Focused Ion Beam Scanning Electron Microscope (FIB-SEM) 2005 vintage.
  • COMMONWEALTH SCIENTIFIC / VEECO: -

    COMMONWEALTH SCIENTIFIC / VEECO - Ion milling system Source: 4" Rotating substrate holder, adjustable angle Power supply Roughing pump Diffusion pump.
  • COMMONWEALTH SCIENTIFIC / VEECO: 8C

    COMMONWEALTH SCIENTIFIC / VEECO 8C Ion Milling systems Rotating stage Requires clamping fixture to hold 4" wafer Hot tungsten wire neutralizer (front) Operation Semi-automatic Voltage 200V 3 Phases Process Chamber 304 Stainless Steel Ultimate Vacuum 1.0E-6 torr Sample Size 2" - 4"(7 pieces) Process Angle -90° to +90° (Motor-driven) Fixture rotation Yes Fixture cooling Chiller Ion Source Kaufman Ion Source Process Gas Argon with MFC control Filament Cathode Tungsten Filament Ion Gun Power Supply WELL 5100 (Japan) Ion Gun Max Power 1000V Ion Gun Max Current 800mA Grid Assembly Molybdenum High Vacuum Pump Varian VHS-10 Diffusion pump(5300 l/s) Low Vacuum Pump Leybold D30A Gauge Controller Granville Phillips 307 Stage capable of handling 7 wafers The ion source controller has been upgraded to Well 5200 1994 vintage.
  • COMMONWEALTH SCIENTIFIC / VEECO: SORCERER

    COMMONWEALTH SCIENTIFIC / VEECO Sorcerer Ion Beam system Ion Power Supply 6" Stage with rotation and tilt Large cylindrical chamber (CHA Mark 40) Pfieffer 2200 turbo pump Mass flow controls
  • COMMONWEALTH SCIENTIFIC / VEECO: SORCERER

    COMMONWEALTH SCIENTIFIC / VEECO Sorcerer Ion Beam system Ion Power Supply 6" Stage with rotation and tilt Large cylindrical chamber (CHA Mark 40) Pfieffer 2200 turbo pump Mass flow controls
  • COMMONWEALTH SCIENTIFIC / VEECO: SORCERER

    COMMONWEALTH SCIENTIFIC / VEECO Sorcerer Ion Beam system Ion Power Supply 6" Stage with rotation and tilt Large cylindrical chamber (CHA Mark 40) Pfieffer 2200 turbo pump Mass flow controls
  • COMMONWEALTH SCIENTIFIC / VEECO: IBD MILLATRON

    COMMONWEALTH SCIENTIFIC / VEECO IBD Millatron Ion beam system with transformer.
  • DENTON VACUUM: CC-105

    DENTON CC-105 Ion assist gun Installation kit and spare parts, as-is 2005 vintage.
  • FEI: DB235

    FEI DB235 DualBeam FIB System.
  • FEI: VECTRA+

    FEI Vectra+ Circuit edit focused ion beam system (FIB) Vision column upgrade In-chamber microscope Color FIB Assist Enhanced stage current endpoint system Enhanced secondary endpoint and imaging BPA / COGNEX (Beam placement accuracy for 65 nm node) INDIGO IR Camera: With ultra long working distance objective Internal engine transplant FEI FIBICS FEI Vectra WD reduction upgrade VARIAN Tri scroll pump 1998 vintage.
  • FEI: STRATA 400S

    FEI Strata 400S Dual ion beam system Includes: Ion gun Wafer loadlock: Loadport stage / Detector EDAX X-ray analysis system: LN2 Free silicon drift detector SFEG Ultra high resolution SEM 5 Axis stage: 100mm x 100mm XY Turbo vacuum PIA Upgraded for advanced patterning capabilities Magnum ion column Various detectors CCD Chamber camera Resolution: 0.8nm Piezo stage Loadlock: 75 mm SEM: 200V - 30kV EDX X-Ray analysis system: <30nm Not includes: HDD Autoprobe Control rack.
  • FEI: HELIOS NANOLAB 400S

    FEI Helios NanoLab 400S FIB-Scanning electron microscope (SEM) Dual beam Missing parts: PIA Mother board EOCU Rack CCB Board QCTU Board OQAD Board OGLD Board DSGS Board / HT DPMT Board HDD Currently warehoused.
  • FEI: HELIOS NANOLAB 460HP

    FEI Helios NanoLab 460HP Dual beam system X-Ray spectrometers (EDS / WDS) With resolution down to 30 nm Specification: Electron source: Schottky thermal field emitter Ion source: Gallium liquid metal, 1000 hours Landing voltage: 20 V – 30 kV SEM 500 V – 30 kV FIB SEM Resolution: Optimal WD: 0.6 nm at 2–15 kV 0.7 nm at 1 kV 1.5 nm at 200 V With beam deceleration Coincident WD: 0.8 nm at 15 kV 0.9 nm at 5 kV 1.2 nm at 1 kV FIB Resolution coincident WD: 4.0 nm at 30 kV (Using preferred statistical method) 2.5 nm at 30 kV (Using selective edge method) EDS Resolution: < 30 nm On thinned samples In situ TEM sample liftout: EasyLift EX nanomanipulator Stage: (5) Axis all piezo motorized XY Motion: 100 mm QuickFlip shuttle Sample types: Wafer pieces, packaged parts, TEM Grids, whole wafers: Up to 100 mm Maximum sample size: Diameter: 100 mm With full travel User interface: Windows GUI With integrated SEM, FIB, GIS, simultaneous patterning and imaging mode (3) LCD Monitors: 24" Widescreen Key options: Beam chemistry: Standard gas injection systems MultiChem gas delivery system Hardware: EDS, WDS, EBSD Analysis 2014 vintage.
  • FEI: HELIOS NANOLAB 400

    FEI Helios NanoLab 400 Focused ion beam (FIB) system Dual beam.
  • FEI: FIB 825I

    FEI FIB 825i Ion beam inspection system With industrial computer VIEWSONIC VA2231WM Flat screen monitor Keyboard Mouse Joystick Control panel FEI LBO50MA Display unit KEITHLEY 485 Auto ranging picoammeter AVA Controller Spicer consulting field canceling system EDWARDS QDP40 Vacuum With Series II-MCM electrical box Manuals.
  • FEI: NOVA 600

    FEI Nova 600 Dual beam FIB SEM Elemental detector: EDAX Platinum deposition (2) Etchers (Selective carbon / Ideliniation) 6 Channels amplifier P/N: 1027639 FEI Panel type: 2067/31 Oil free pump unit Fans.
  • FEI: STRATA DB235

    FEI Strata DB235 Focused ion beam (FIB) system E-Beam imaging resolution: <2.5 nm I-Beam imaging resolution: ~ 7 nm (3) Gas injection systems (GIS) for material deposition: Pt, carbon, selective carbon mill E-Gun type: Sirion SFEG I-Gun type: Magnum (2) Resolution modes: Search mode UHR (Ultra high resolution) Mode with immersion lens Detectors & imaging modes: SED (Everhart thornley) (ETD) Through the lens detector (TLD) TLD-S (Secondary electron imaging) TLD-B (Back scattered electron imaging) TLD-C (Charge reduction) TLD-D (Down hole) Motor stage: 50 mm x 50 mm Model 100.5 omni probe TMP Computer OS: Windows XP Upgraded with: HT Gun cable XEI Plasma cleaner Computer (2008) OL Pole piece 2015 Main power supply (SMPS).
  • FEI: V400 ACE

    FEI V400 ACE Single beam system Tomahawk focused ion column High accuracy eucentric stage: 100x100mm Loadlock Manochemix box: Gases: XeF2, H20, CI2, TMCTS, W Integrated real time monitor (iRTM) CCD IR Chamber camera ICE Seconderay electro and ion detector Oli-free pumping system Auto FIB Seismic restraint kit Seismic chiller: 60Hz Charge neutralizer Delineation etch Bulk silicon trenching IR Microscope DX Chemistry Wide aperture and nozzle FEI CAMELOT Interface Installation kit 2014 vintage.
  • FEI: V400 ACE

    FEI V400 ACE Single beam system Tomahawk focused ion column High accuracy eucentric stage: 100x100mm Loadlock Manochemix box: Gases: XeF2, H20, CI2, TMCTS, W Integrated real time monitor (iRTM) CCD IR Chamber camera ICE Seconderay electro and ion detector Oli-free pumping system Auto FIB Seismic restraint kit Seismic chiller: 60Hz Charge neutralizer Delineation etch Bulk silicon trenching IR Microscope DX Chemistry Wide aperture and nozzle FEI CAMELOT Interface Installation kit 2014 vintage.
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