Sputtering Systems

- - Sputtering system Aproximate 110" Sputtering pilot line: GLASTECHNIK ANLAGENBAU WM80 VB3 DDS Dry chamber Sputter deposition tool Inline sputtering (9) Chambers (2) Si (3) Moly (3) CIGS (4) LEYBOLD RUVAC WAU 1001 H Vacuum blowers (4) LEYBOLD RUVAC RA 3001 Roots vacuum pumps (4) LEYBOLD SOGEVAC SV300 Rotary vane vacuum pumps LEYBOLD TURBOTRONIK NT 20 Frequency converters in (2) Cabinets (6) HUTTINGER Power panels for chambers with TIG 60 DC Units POLYCOLD PFC-1102 HC Cryogenic refrigeration unit KELVIN-PLAST K450/60 Closed loop heat exchange water cooling system Including (3) Swep heat exchangers (GX-42, GX-6R, GC-26P) Roth Regenwasser 1500L Tank Solar testing cabinet with ARRI X40/25 lamp HAGER ROLLER Conveyor FLOWSTAR Laminar flow bench Target transfer / Load cart Power cabinets Computers & monitors with bench.

- - Sputtering system Aproximate 110" Sputtering pilot line: GLASTECHNIK ANLAGENBAU WM80 VB3 DDS Dry chamber Sputter deposition tool Inline sputtering (9) Chambers (2) Si (3) Moly (3) CIGS (4) LEYBOLD RUVAC WAU 1001 H Vacuum blowers (4) LEYBOLD RUVAC RA 3001 Roots vacuum pumps (4) LEYBOLD SOGEVAC SV300 Rotary vane vacuum pumps LEYBOLD TURBOTRONIK NT 20 Frequency converters in (2) Cabinets (6) HUTTINGER Power panels for chambers with TIG 60 DC Units POLYCOLD PFC-1102 HC Cryogenic refrigeration unit KELVIN-PLAST K450/60 Closed loop heat exchange water cooling system Including (3) Swep heat exchangers (GX-42, GX-6R, GC-26P) Roth Regenwasser 1500L Tank Solar testing cabinet with ARRI X40/25 lamp HAGER ROLLER Conveyor FLOWSTAR Laminar flow bench Target transfer / Load cart Power cabinets Computers & monitors with bench.

- - Sputtering system Aproximate 110" Sputtering pilot line: GLASTECHNIK ANLAGENBAU WM80 VB3 DDS Dry chamber Sputter deposition tool Inline sputtering (9) Chambers (2) Si (3) Moly (3) CIGS (4) LEYBOLD RUVAC WAU 1001 H Vacuum blowers (4) LEYBOLD RUVAC RA 3001 Roots vacuum pumps (4) LEYBOLD SOGEVAC SV300 Rotary vane vacuum pumps LEYBOLD TURBOTRONIK NT 20 Frequency converters in (2) Cabinets (6) HUTTINGER Power panels for chambers with TIG 60 DC Units POLYCOLD PFC-1102 HC Cryogenic refrigeration unit KELVIN-PLAST K450/60 Closed loop heat exchange water cooling system Including (3) Swep heat exchangers (GX-42, GX-6R, GC-26P) Roth Regenwasser 1500L Tank Solar testing cabinet with ARRI X40/25 lamp HAGER ROLLER Conveyor FLOWSTAR Laminar flow bench Target transfer / Load cart Power cabinets Computers & monitors with bench.

AIRCO TEMESCAL BJD-1800 Sputter system (3) Cathodes: (2) Cathodes are configured for RF magnetron co-sputtering One cathode is configured for DC magnetron sputtering Load lock consists: Gate valve Adapter flange Motorized linear motion assembly 18” Diameter stainless steel process chamber Lower source tray swings out for maintenance Rotating substrate table: 7.5” Diameter 300-Watt RF biasing capability Rotate from 5 rpm to 100 rpm Process chamber is fully shielded and the shielding is flame sprayed Process chamber is pumped with ALCATEL 5900 Turbo molecular pump (880 l/s) Servo motor controlled throttle valve (3) Angstrom Sciences 2” diameter magnetron cathodes Cathode can be adjusted for angle and distance from substrate Independent shutter system ADVANCED ENERGY MDX 1kW DC Sputtering power supply (2) ADVANCED ENERGY 600 Watt RF generators Automatic impedance matching networks for magnetron cathode sputtering ADVANCED ENERGY 300 Watt RF generator Automatic impedance matching networks for biasing the substrate (3) MFC (mass flow control) Process gas plumbing is UHP stainless steel VCR Fittings throughout Electro-polished Orbit-ally welded Fully leak tested 1 Torr full-scale capacitance manometer Automatic isolation valve to prevent venting of manometer LEYBOLD D-30 20.9 CFM mechanical pump System base pressure: Better then 1 x10-7 torr Documentation.

AIRCO TEMESCAL BJD-1800 Sputter system (3) Cathodes: (2) Cathodes: Configured for RF MAGNETRON co-sputtering Cathode: Configured for DC MAGNETRON sputtering Load lock consists: Gate valve Adapter flange Motorized linear motion assembly Diameter stainless steel process chamber, 18” Lower source tray swings out for maintenance Rotating substrate table: Diameter: 7.5” RF Biasing capability: 300-Watt Rotate: 5 RPM-100 RPM Process chamber: Fully shielded and shielding is flame sprayed Pumped with ALCATEL 5900 Turbo molecular pump (880 l/s) Servo motor controlled throttle valve (3) ANGSTROM SCIENCES MAGNETRON Cathodes: 2” Diameter Independent shutter system ADVANCED ENERGY MDX DC Sputtering power supply: 1kW (2) ADVANCED ENERGY 600 Watt RF Generators Automatic impedance matching networks for magnetron cathode sputtering ADVANCED ENERGY 300 Watt RF Generator Automatic impedance matching networks for biasing substrate (3) MFC (Mass flow controls) Process gas plumbing: UHP Stainless steel VCR Fittings throughout Electro-polished Orbitally welded Fully leak tested Full-scale capacitance manometer: 1 Torr Automatic isolation valve to prevent venting of manometer LEYBOLD D-30 20.9 CFM Mechanical pump System base pressure: Better than 1x10-7 torr Materials: Ti, Cr, W, Ge, Si, Fe, MoS2, ITO, Ag, Nb, Cu, SiN, TiN, Al Documentation 2009 vintage.

AIRCO TEMESCAL BJD-1800 Sputter system (3) Cathodes: (2) Cathodes are configured for RF magnetron co-sputtering One cathode is configured for DC magnetron sputtering Load lock consists: Gate valve Adapter flange Motorized linear motion assembly 18” Diameter stainless steel process chamber Lower source tray swings out for maintenance Rotating substrate table: 7.5” Diameter 300-Watt RF biasing capability Rotate from 5 rpm to 100 rpm Process chamber is fully shielded and the shielding is flame sprayed Process chamber is pumped with ALCATEL 5900 Turbo molecular pump (880 l/s) Servo motor controlled throttle valve (3) Angstrom Sciences 2” diameter magnetron cathodes Cathode can be adjusted for angle and distance from substrate Independent shutter system ADVANCED ENERGY MDX 1kW DC Sputtering power supply (2) ADVANCED ENERGY 600 Watt RF generators Automatic impedance matching networks for magnetron cathode sputtering ADVANCED ENERGY 300 Watt RF generator Automatic impedance matching networks for biasing the substrate (3) MFC (mass flow control) Process gas plumbing is UHP stainless steel VCR Fittings throughout Electro-polished Orbit-ally welded Fully leak tested 1 Torr full-scale capacitance manometer Automatic isolation valve to prevent venting of manometer LEYBOLD D-30 20.9 CFM mechanical pump System base pressure: Better then 1 x10-7 torr Documentation.

AIRCO TEMESCAL BJD-1800 Sputter system (3) Cathodes: (2) Cathodes: Configured for RF magnetron co-sputtering Cathode: Configured for DC magnetron sputtering Load lock consists: Gate valve Adapter flange Motorized linear motion assembly Diameter stainless steel process chamber, 18” Lower source tray swings out for maintenance Rotating substrate table: Diameter: 7.5” RF Biasing capability: 300-Watt Rotate: 5 rpm-100 rpm Process chamber: Fully shielded and shielding is flame sprayed Pumped with ALCATEL 5900 Turbo molecular pump (880 l/s) Servo motor controlled throttle valve (3) ANGSTROM SCIENCES 2” Diameter magnetron cathodes Cathode can be adjusted for angle and distance from substrate Independent shutter system ADVANCED ENERGY MDX 1kW DC Sputtering power supply (2) ADVANCED ENERGY 600 Watt RF Generators Automatic impedance matching networks for magnetron cathode sputtering ADVANCED ENERGY 300 Watt RF Generator Automatic impedance matching networks for biasing substrate (3) MFC (Mass flow control) Process gas plumbing: UHP Stainless steel VCR Fittings throughout Electro-polished Orbitally welded Fully leak tested 1 Torr full-scale capacitance manometer Automatic isolation valve to prevent venting of manometer LEYBOLD D-30 20.9 CFM mechanical pump System base pressure: Better than 1x10-7 torr Materials: Ti, Cr, W, Ge, Si, Fe, MoS2, ITO, Ag, Nb, Cu, SiN, TiN, Al Documentation 2009 vintage.

AIRCO TEMESCAL BJD-1800 Sputter system (3) Cathodes: (2) Cathodes: Configured for RF magnetron co-sputtering Cathode: Configured for DC magnetron sputtering Load lock consists: Gate valve Adapter flange Motorized linear motion assembly Diameter stainless steel process chamber, 18” Lower source tray swings out for maintenance Rotating substrate table: Diameter: 7.5” RF Biasing capability: 300-Watt Rotate: 5 rpm-100 rpm Process chamber: Fully shielded and shielding is flame sprayed Pumped with ALCATEL 5900 Turbo molecular pump (880 l/s) Servo motor controlled throttle valve (3) ANGSTROM SCIENCES 2” Diameter magnetron cathodes Cathode can be adjusted for angle and distance from substrate Independent shutter system ADVANCED ENERGY MDX 1kW DC Sputtering power supply (2) ADVANCED ENERGY 600 Watt RF Generators Automatic impedance matching networks for magnetron cathode sputtering ADVANCED ENERGY 300 Watt RF Generator Automatic impedance matching networks for biasing substrate (3) MFC (Mass flow control) Process gas plumbing: UHP Stainless steel VCR Fittings throughout Electro-polished Orbitally welded Fully leak tested 1 Torr full-scale capacitance manometer Automatic isolation valve to prevent venting of manometer LEYBOLD D-30 20.9 CFM mechanical pump System base pressure: Better than 1x10-7 torr Materials: Ti, Cr, W, Ge, Si, Fe, MoS2, ITO, Ag, Nb, Cu, SiN, TiN, Al Documentation 2009 vintage.

AIRCO TEMESCAL BJD-1800 Sputter system (3) Cathodes: (2) Cathodes: Configured for RF MAGNETRON co-sputtering Cathode: Configured for DC MAGNETRON sputtering Load lock consists: Gate valve Adapter flange Motorized linear motion assembly Diameter stainless steel process chamber, 18” Lower source tray swings out for maintenance Rotating substrate table: Diameter: 7.5” RF Biasing capability: 300-Watt Rotate: 5 RPM-100 RPM Process chamber: Fully shielded and shielding is flame sprayed Pumped with ALCATEL 5900 Turbo molecular pump (880 l/s) Servo motor controlled throttle valve (3) ANGSTROM SCIENCES MAGNETRON Cathodes: 2” Diameter Independent shutter system ADVANCED ENERGY MDX DC Sputtering power supply: 1kW (2) ADVANCED ENERGY 600 Watt RF Generators Automatic impedance matching networks for magnetron cathode sputtering ADVANCED ENERGY 300 Watt RF Generator Automatic impedance matching networks for biasing substrate (3) MFC (Mass flow controls) Process gas plumbing: UHP Stainless steel VCR Fittings throughout Electro-polished Orbitally welded Fully leak tested Full-scale capacitance manometer: 1 Torr Automatic isolation valve to prevent venting of manometer LEYBOLD D-30 20.9 CFM Mechanical pump System base pressure: Better than 1x10-7 torr Materials: Ti, Cr, W, Ge, Si, Fe, MoS2, ITO, Ag, Nb, Cu, SiN, TiN, Al Documentation 2009 vintage.

AIRCO TEMESCAL BJD-1800 Sputter system (3) Cathodes: (2) Cathodes: Configured for RF MAGNETRON co-sputtering Cathode: Configured for DC MAGNETRON sputtering Load lock consists: Gate valve Adapter flange Motorized linear motion assembly Diameter stainless steel process chamber, 18” Lower source tray swings out for maintenance Rotating substrate table: Diameter: 7.5” RF Biasing capability: 300-Watt Rotate: 5 RPM-100 RPM Process chamber: Fully shielded and shielding is flame sprayed Pumped with ALCATEL 5900 Turbo molecular pump (880 l/s) Servo motor controlled throttle valve (3) ANGSTROM SCIENCES MAGNETRON Cathodes: 2” Diameter Independent shutter system ADVANCED ENERGY MDX DC Sputtering power supply: 1kW (2) ADVANCED ENERGY 600 Watt RF Generators Automatic impedance matching networks for magnetron cathode sputtering ADVANCED ENERGY 300 Watt RF Generator Automatic impedance matching networks for biasing substrate (3) MFC (Mass flow controls) Process gas plumbing: UHP Stainless steel VCR Fittings throughout Electro-polished Orbitally welded Fully leak tested Full-scale capacitance manometer: 1 Torr Automatic isolation valve to prevent venting of manometer LEYBOLD D-30 20.9 CFM Mechanical pump System base pressure: Better than 1x10-7 torr Materials: Ti, Cr, W, Ge, Si, Fe, MoS2, ITO, Ag, Nb, Cu, SiN, TiN, Al Documentation 2009 vintage.

AIRCO TEMESCAL BJD-1800 Sputter system (3) Cathodes: (2) Cathodes: Configured for RF magnetron co-sputtering Cathode: Configured for DC magnetron sputtering Load lock consists: Gate valve Adapter flange Motorized linear motion assembly Diameter stainless steel process chamber, 18” Lower source tray swings out for maintenance Rotating substrate table: Diameter: 7.5” RF Biasing capability: 300-Watt Rotate: 5 rpm-100 rpm Process chamber: Fully shielded and shielding is flame sprayed Pumped with ALCATEL 5900 Turbo molecular pump (880 l/s) Servo motor controlled throttle valve (3) ANGSTROM SCIENCES 2” Diameter magnetron cathodes Cathode can be adjusted for angle and distance from substrate Independent shutter system ADVANCED ENERGY MDX 1kW DC Sputtering power supply (2) ADVANCED ENERGY 600 Watt RF Generators Automatic impedance matching networks for magnetron cathode sputtering ADVANCED ENERGY 300 Watt RF Generator Automatic impedance matching networks for biasing substrate (3) MFC (Mass flow control) Process gas plumbing: UHP Stainless steel VCR Fittings throughout Electro-polished Orbitally welded Fully leak tested 1 Torr full-scale capacitance manometer Automatic isolation valve to prevent venting of manometer LEYBOLD D-30 20.9 CFM mechanical pump System base pressure: Better than 1x10-7 torr Materials: Ti, Cr, W, Ge, Si, Fe, MoS2, ITO, Ag, Nb, Cu, SiN, TiN, Al Documentation 2009 vintage.

AJA ATC Orion 5 UHV Sputter coater Currently configured for manual operation, fully automatic capable Substrate bias and rotation (3) Independent sputter guns (2) DC Power supplies, 500W RF Power supply, 300W Substrate size: < 5.75" diameter (sputter-up) with z-axis shift (2") Rotation to 20 rpm Heating up to 800ºC with RF bias capability to 50 W RF Sputter guns: (3) 2" O.D. Targets With integrated shutters for RF or DC (metallics/dielectrics) sputtering Confocal, sputter-up arrangement Capable of being upgraded to (5) cathodes Power supplies: (2) ADVANCED ENERGY 500 W DC supplies 1300 W Seren RF generator with manual impedance match and selector switch Substrate heating: PID Temperature programmable controller (2) 1000 W Quartz lamps for heating inside water-cooled reflector box Vacuum generation: PFEIFFER 500 L/sec turbo pump With magnetic bearing on vac side and ceramic bearing on motor side Backed by ADIXEN ACP15 dry rotary lobe pump: Oil-free deposition system Sputtered: metals and metal oxides: Copper Precious metals Nickel Iron Vanadium Molybdenum Aluminum Alumina Carbon / Graphite Currently de-installed and stored in a cleanroom 2006 vintage.

AJA ATC Orion 5 Sputtering system (3) Guns Sputtered: Ni, Co, Au (2) DCXS-750-4 DC Power supplies AIT-100/300 RF Auto tuner PD-30A Power distribution SHC-10 PID Heater controller MKS 937B Gauge controller VAT Adaptive pressure controller INFICON SQM-160 Thin film deposition monitor Chamber: Top: Hinged with VITON o-ring seal Used with substrate holder / Sputter sources Bottom: CF, 14" With copper gasket Used with substrate holder / Sputter sources Ports on chamber: (2) CF View ports, 6" With integrated shutters Turbo pump / Gate valve (8" CF) Vacuum gauges ((2) 2.75" CF, (1) 1.33" CF) Process gas introduction Vent valve Future loadlock (8" CF) Vacuum pumping: PFEIFFER wide range turbo pump with controller, 260 l/s Cables and delayed vent valve ADIXEN / PFEIFFER Rotary vane mechanical backing pump, 7 cfm Ancillary equipment included 2018 vintage.

AJA ATC Orion 5 UHV Sputter coater Currently configured for manual operation, fully automatic capable Substrate bias and rotation (3) Independent sputter guns (2) DC Power supplies, 500W RF Power supply, 300W Substrate size: < 5.75" diameter (sputter-up) with z-axis shift (2") Rotation to 20 rpm Heating up to 800ºC with RF bias capability to 50 W RF Sputter guns: (3) 2" O.D. Targets With integrated shutters for RF or DC (metallics/dielectrics) sputtering Confocal, sputter-up arrangement Capable of being upgraded to (5) cathodes Power supplies: (2) ADVANCED ENERGY 500 W DC supplies 1300 W Seren RF generator with manual impedance match and selector switch Substrate heating: PID Temperature programmable controller (2) 1000 W Quartz lamps for heating inside water-cooled reflector box Vacuum generation: PFEIFFER 500 L/sec turbo pump With magnetic bearing on vac side and ceramic bearing on motor side Backed by ADIXEN ACP15 dry rotary lobe pump: Oil-free deposition system Sputtered: metals and metal oxides: Copper Precious metals Nickel Iron Vanadium Molybdenum Aluminum Alumina Carbon / Graphite Currently de-installed and stored in a cleanroom 2006 vintage.

AJA ATC Orion 5 Sputtering system (3) Guns Sputtered: Ni, Co, Au (2) DCXS-750-4 DC Power supplies AIT-100/300 RF Auto tuner PD-30A Power distribution SHC-10 PID Heater controller MKS 937B Gauge controller VAT Adaptive pressure controller INFICON SQM-160 Thin film deposition monitor Chamber: Top: Hinged with VITON o-ring seal Used with substrate holder / Sputter sources Bottom: CF, 14" With copper gasket Used with substrate holder / Sputter sources Ports on chamber: (2) CF View ports, 6" With integrated shutters Turbo pump / Gate valve (8" CF) Vacuum gauges ((2) 2.75" CF, (1) 1.33" CF) Process gas introduction Vent valve Future loadlock (8" CF) Vacuum pumping: PFEIFFER wide range turbo pump with controller, 260 l/s Cables and delayed vent valve ADIXEN / PFEIFFER Rotary vane mechanical backing pump, 7 cfm Ancillary equipment included 2018 vintage.

AJA ATC Orion 5 UHV Sputter coater Currently configured for manual operation, fully automatic capable Substrate bias and rotation (3) Independent sputter guns (2) DC Power supplies, 500W RF Power supply, 300W Substrate size: < 5.75" diameter (sputter-up) with z-axis shift (2") Rotation to 20 rpm Heating up to 800ºC with RF bias capability to 50 W RF Sputter guns: (3) 2" O.D. Targets With integrated shutters for RF or DC (metallics/dielectrics) sputtering Confocal, sputter-up arrangement Capable of being upgraded to (5) cathodes Power supplies: (2) ADVANCED ENERGY 500 W DC supplies 1300 W Seren RF generator with manual impedance match and selector switch Substrate heating: PID Temperature programmable controller (2) 1000 W Quartz lamps for heating inside water-cooled reflector box Vacuum generation: PFEIFFER 500 L/sec turbo pump With magnetic bearing on vac side and ceramic bearing on motor side Backed by ADIXEN ACP15 dry rotary lobe pump: Oil-free deposition system Sputtered: metals and metal oxides: Copper Precious metals Nickel Iron Vanadium Molybdenum Aluminum Alumina Carbon / Graphite Currently de-installed and stored in a cleanroom 2006 vintage.

AJA ATC 1800-V Sputtering system 2010 vintage.

AJA ATC 1800-V Sputtering system 2010 vintage.

AJA ATC 3400-V Sputtering system Currently configured as a roll coater but convertible to drum coater Vertically oriented web drive system Web width capacity: 5" Ion surface treatment source Quartz crystal rate monitors PLANAR Magnetron sputter source Dual planar magnetron sputter source (AC and bipolar capable) Not included: ADVANCED ENERGY Pinnacle+ pulsed DC sputter power supply ADVANCED ENERGY PEII AC Sputter power supply 10 kW SHIMADZU Turbo-molecular vacuum pump ALCATEL Mechanical vacuum pump Dual sputter gases with mass flow controllers PCC Polycold Meissner trap - ~1.5 E-07 Torr Linear cathodes – 5” x 15” (2) Bays: 1: Single ended cathode 2: Dual magnetron sputtering.

AJA ATC 3400-V Sputtering system Vertically oriented web drive system Web width capacity: 5" Ion surface treatment source QUARTZ Crystal rate monitors PLANAR Magnetron sputter source Dual planar magnetron sputter source (AC and bipolar capable) ADVANCED ENERGY PEII AC Sputter power supply 10 kW SHIMADZU Turbo-molecular vacuum pump ALCATEL Mechanical vacuum pump Dual sputter gases with mass flow controllers PCC Polycold meissner trap: ~1.5 E-07 Torr Linear cathodes: 5" x 15" (2) Bays: Single ended cathode Dual magnetron sputtering. Does not include ADVANCED ENERGY Pinnacle+ pulsed DC sputter power supply.