Used AMTECH / TEMPRESS TS61004 4 #293610337 for sale

AMTECH / TEMPRESS TS61004 4
ID: 293610337
LP-CVD System.
AMTECH / TEMPRESS TS61004 4 is a diffusion furnace used in a variety of semiconductor applications. It is used to thermally process and diffusion a wide range of materials including metals, dielectrics, ceramics, composites, and alloys. The furnace features a vertical graphite-wall vessel with an internal CF4/S hydrogen atmosphere. The furnace is capable of reaching temperatures between 300°C to 1200°C and is capable of rapid thermal processing. It utilizes a heat distribution system that uses forced convection with a molybdenum heating element located in the bottom of the furnace, which is coupled with graphite elements in the walls of the vessel. This design ensures uniform, repeatable temperature profiles across the sample. The heating elements are also designed to reduce oxidation and distortion of the sample during the diffusion process. AMTECH TS61004 4 is equipped with a temperature controller that allows accurate and repeatable temperature readings of up to 1°C. It also features a temperature alarm system to alert the user of any dangers, such as rising temperatures or low atmosphere pressure. This provides the user with ample warning and allows them to adjust the diffusion process as necessary. The furnace is also equipped with cool-down valves, allowing the furnace to cool down quickly and safely. The combination of the cooling valves and the forced convection system ensures a fast cool-down process. TEMPRESS TS61004 4 diffusion furnace also includes accessories and tools to ensure accuracy and safety during the process. These include a sample holder to ensure that the sample being processed is secure and stable, as well as a pressure monitor to ensure the pressure within the vessel remains within safe operating parameters. In summary, TS61004 4 is a reliable, repeatable and efficient diffusion furnace that produces high quality results. With its range of additional features, accessories and tools, it allows for a safe and accurate diffusion process with minimal risk and maximum precision.
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