Ion Milling

Ion milling system Source: 4" Rotating substrate holder, adjustable angle Power supply Roughing pump Diffusion pump.

Turbo Pumped Argon/Reactive Plasma DuoMill Dual Station Ion Milling System Ion milling system for the preparation of high quality TEM specimens (2) independent milling stations mounted on a single high speed vacuum system Each milling station has a Whisperlok specimen exchange system which functions without disturbing the vacuum or milling conditions of the other station and two Octogun ion guns.

Ion mill etcher Includes: (8) Spare component modules 1980 vintage.

Ion milling system, 1996 vintage.

Precision ion polishing system Ion source: Ion guns: (2) Penning ion guns Milling angle: +10i to -10i, (adjustable) Ion beam energy: 1.5keV to 6keV Beam diameter: 350m FWHM at 5keV to 800m FWHM at 5keV For broad beam guns Ion current density: 10mA/cm2 peak Beam alignement: Precision beam alignment Specimen stage: Sample size: 3mm or 2.3mm Mounting: Gatan patented DuoPost (standard) or Graphite holder (optional) Rotation: Variable from 1 to 6 rpm Beam modulation: Single or double sector for exceptional cross-sectioning Viewing: Binocular microscope: 40x or 80x Vacuum: Dry pumping system: Molecular drag pump Pressure: Base pressure: 5E-6 torr Operating pressure: 8E-5 torr Vacuum gauge: Penning type for main chamber Solid-state for backing pump Specimen airlock: GATAN Whisperlok Specimen exchange time: <30sec.

Focused ion beam system Electron and ion beams: Yes (2) Gas injection systems: PT, unlabeled Detectors: Secondary Backscatter Chamberscope Main instrument: Semiconductor Stage tilt: Yes Rotation capability: 45° or more Features / addons: Micromanipulator Second gas: Ins 2004 vintage.

Ion mill Cryo pumped.

Ion beam etcher, 6"-8" Process modules transport module systems include: BROOKS Automation robot wafer handler system Loadlock A & B Electronics cabinet contains: (2) APC 450 UPS Raritan compu-switch Industrial PC (2) LEYBOLD INFICON IG3 Vacuum gauge controllers LEYBOLD NT20 Turbovac controller (2) SORENSEN DCS60-18 Power supplies SORENSEN DCS20-150 Power supply SPELLMAN SL300 Power supply SPELLMAN SL1200 Power supply Process modules include: LEYBOLD MAG2000 Turbo pump & controller CTI Onboard cyropump with fastregen sputtering module CTI 9600 Compresser RFPP AM-10/20 Auto matching network ADVANCED ENERGY RF10M / RF20M Power supply CTI Onboard controller RF matching network monitor ADVANCED ENERGY RF-20MWC RF Generator Main power distribution panel: 208V,100A 1997 vintage.

Ion beam deposition system, 6".

Focused ion beam system 2000 vintage.

Focused ion beam system.

Focused ion beam (FIB) system Source: Gallium ion source Resolution: 5 nm (potentially up to 10nm) Image: Micro channel plate Analog channeling with 256 grey level for high contrast Gas injector: Tungsten (for deposition) Chlorine (for selective etching) XeF2 (for selective etching) Spare port for other gases Charge: Neutralization: E gun (Filament issue) Load / Unload: Half automatic load lock Vacuum system: PFEIFFER Turbo pump system with fore pump Stage: 3” (6) Axes eucentric tilt stage Tilt: 0 – 60° Rotation: 360° (+/- 180°) Eucentric tilt axis: Small Z: 10 mm (For eucentric compensation) Big Z: 20 mm X / Y: 75 mm Power supply: 50 kV Bipolar supply for high current mode.

Ion beam etching system, 6" Currently installed and stored in cleanroom 2007 vintage.

Focused ion beam (FIB) system Pumps not included.

Ion milling system.

Ion beam inspection tool, 8" EDX is not working Currently de-installed Cables intact 1998 vintage.

Ion Milling systems Rotating stage Requires clamping fixture to hold 4" wafer Hot tungsten wire neutralizer (front) Operation Semi-automatic Voltage 200V 3 Phases Process Chamber 304 Stainless Steel Ultimate Vacuum 1.0E-6 torr Sample Size 2＂ - 4＂(7 pieces) Process Angle -90° to +90° (Motor-driven) Fixture rotation Yes Fixture cooling Chiller Ion Source Kaufman Ion Source Process Gas Argon with MFC control Filament Cathode Tungsten Filament Ion Gun Power Supply WELL 5100 (Japan) Ion Gun Max Power 1000V Ion Gun Max Current 800mA Grid Assembly Molybdenum High Vacuum Pump Varian VHS-10 Diffusion pump（5300 l/s） Low Vacuum Pump Leybold D30A Gauge Controller Granville Phillips 307 Stage capable of handling 7 wafers The ion source controller has been upgraded to Well 5200 1994 vintage.

Ion beam system with transformer.

Dual ion mill, argon.

Milling machine 6000 RPM maximum X travel: 30” Y travel: 20” Z travel: 20” Box ways look like mirrors Rapid Traverse (Positioning): 0.1 to 393 IPM (1 to 9999 mm/m) Cutting: 0.1 to 393 IPM (1 to 9999 mm/m) Programmable: 0.1 to 393 IPM (1 to 9999 mm/m) Programming Resolution: .0001" (.002mm) X Y Z System Resolution: .0001" (.002mm) X Y Z Spindle rpms: 60 - 6000 Horsepower: 10 continuous 15 30 minutes Taper CAT 40 Spindle cartridge has oil circulating around it that is temperature controlled by an oil chiller ATC positions 24, bidirectional 15 retention knobs come with mill Coolant flood, mist manual and programmable Working load: 1100 lbs evenly distributed Dynapath Delta 10 control: Conversational / G - code 4 axes ready A axis displayed on screen 4th axis controller board installed in control cardrack Options: Concurrency Basic calc assist Macros Graphics Rigid tapping and buffered input Additional available options: Expanded part program storage Digitizing interface Probing Customer prepared cycles Advanced calc assist and tool life management Upgrade to Delta 20 Currently under power 1992 vintage.