Mask Aligners

Projection mask alignment system.

Aligners, 4"-6" Mask sizes: 5”-7” Resolution: 1.5 um (Using positive resist) Illumination: High pressure mercury lamp: 2 kW Wavelengths: 365nm (I-Line), 405nm (H-line), 436nm (G-line) Intensity: (@ 1800 Watts power output) >700mW, 4" >650mW, 5" >600mW, 6" Intensity / Exposure uniformity: Within ± 3% CTC: Monitors and controls system temperature within ±3°C PDC: Provides fine distortion compensation Automatic alignment: HeNe (633nm) Laser beam scanning Alignment modes: Spot beam / Sheet beam Accuracy: 3 Sigma <=.54 um MPA-600 FA: 200 VAC, 3-Phase, 6 kVA, 50/60 Hz Air supply (CTC): 200 VAC, 3-Phase, 8 kVA, 50/60 Hz CDA (Clean dry air) Pressure: Flow rate 130 lit/min Vacuum: >50 cmHg Exhaust flow (For illuminator): 6.5 m/sec - 9.5 m/sec (Measured at illuminator output).

Aligner, 4" Alignment accuracy (between upper and lower side of the wafer): <2 Microns Alignment table rotation: <2° Double side exposure Cassette to cassette handling Bright field and dark field illumination Diffraction reducing optical systems 350W HBO Lamps.

Aligner System can be modified to any configuration.

System 100 V, 50 / 60 Hz, 6 A.

Aligners, 4"-6" With 500W UV or DUV Illumination system Print resolution:1 mu.

Aligner, 3"-4" IR Back side alignment.

Mask aligner.

Mask aligner Collimated lens: 10" Diameter Calibrated stereo zoom optics Sliding mask alignment fixture and microscope Choice of: 6 x 6" masks for 5" wafers 7 x 7" masks for 6" wafers 9 x 9" masks for 8" wafers.

Mask aligner, 4" 6" Capable (With kit) Topside alignment / Exposure only With 1000W lamp Split field microscope Power supply: 350 / 500 / 1000.

Mask aligner, 4" Hard / soft contact modes (1) Micron resolution Split field video optics Requires 115V, house nitrogen or CDA, house vacuum Power supply: 350 Watt.

Mask aligner, 2" 2007 vintage.

Mask aligner.

Aligners, 4"and 5".

Mask aligner.

Aligners, 6".

Mask aligner Lamp power supply CIC00/1000 for constant power and constant intensity Exposure optics: UV400 Exposure timer M204 Splitfield microscope with photo tubes Included: (10) Occulars Set of objectives OLYMPUS MPlan FL N 10x/0,30 Mask holder bottom loading, 5" Wafer diameter: 100 mm Chuck specification for substrates / 100 mm wafer for soft contact.

Double sided mask aligner (2) 350 Watt lamp houses UV 400 Optics (2) Internal sensors: 65nm / 405nm (2) SUSS CIC 500 Constant intensity UV power supplies SUSS Split-field bottom side microscope: (2) 150 Watt fiber optic microscope illuminators (2) 10x Objectives (2) 10x Eyepieces Proximity Soft contact capable Soft contact chuck (2) Mask holders Manuals.

Mask aligner 2011 vintage.

Mask aligner, 4" BSA Lamphouse: 500W Automatic filter exchanger Conversion kit: 6" 2008 vintage.