Used ASM A 412 Doped Poly #9359390 for sale

ASM A 412 Doped Poly
ID: 9359390
Wafer Size: 12"
Furnace, 12".
ASM A 412 Doped Poly is a diffusion furnace and accessory designed to provide pre-dope epitaxy in the fabrication of semiconductor devices. It is fitted with two 6" quartz tube ovens that are adjustable in temperature from 200 to 1500°C. The furnace also features independent temperature control, a single stage temperature ramp, adjustable reaction pressure, a boron doped polysilicon heater, mechanical and electronic shutter assemblies, and a power supply equipment. The A 412 is particularly versatile in its technical features, designed for applications ranging from rapid dosing of volatile dopants such as GFSI, BPSG, arsenic, phosphorus, boron, phosphorous, and antimony; to gas-source cooling for faster thermal response; to uni-directional CVD and nitride film deposition. The boron doped polysilicon heater ensures maximum efficiency, uniform heat transfer, and fast thermal cycling. Through its use of a single stage temperature ramp system, reaction pressure can be adjusted to enhance or limit vaporization and, consequently, limit the amount of volatile dopant escape. Its mechanical and electronic shutter assemblies allow complete closure of the afterpressure, preventing any foreign materials from entering the upstream reaction chamber. Furthermore, the A 412's power supply unit provides power ranging from 0 -100%, with 0% being considered off, and 100% being considered 'high power.' With this design, you can easily adjust the power to the universal constant, making it ideal for those applications that require high temperatures and specific power output. In short, A 412 Doped Poly is an epitaxy diffusion furnace boasting a wealth of features designed to facilitate rapid doping of volatile dopants. Its adjustable temperature range, single stage temperature ramp, adjustable reaction pressure, boron doped polysilicon heater, power supply machine, and mechanical and electronic shutter assemblies make it the perfect solution for pre-doping in the fabrication of semiconductor devices.
There are no reviews yet