Used ASM A 412 #9205124 for sale
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ID: 9205124
Wafer Size: 12"
Vertical LPCVD furnace, 12"
Process: NITR
General specification:
Heater element: MRL
Process condition: NIT
Maximum operating temperature: 900c
N2 Load lock
Production wafers: (100) Pieces per boat
Boat operation:
Dual boat
Dual chamber
Furnace:
Loading area light: White
Force air cooling system: Fast ramp
Side maintenance
O2 Density control: 0-100ppm
Furnace temperature controller: MTC
Wafer / Carrier handling:
Carrier type: 12" FOUP
Carrier stage capacity: 12" FOUP
Robot type: GENMARK
Gas distribution:
IGS Maker / Type: FUJIKIN
IGS MFC Maker / Type: HORIBA
IGS Press transducer maker / Type: MYKROLIS
Exhaust specification:
Vacuum gage:
10 torr: MKS
1000 torr: MKS
Main valve: MKS
Pump maker / Model: EDWARDS 1800HTX
Low vacuum valve: MKS
Trap: ASM
Vacuum pressure controller: MKS
Reactor:
Outer / Inner tube material (LP): Quartz
Inner tube yype (LP): Quartz
Inner T/C: TYPE-R LPC /Topco
Boat materail/Type: SiC
Boat rotation
Pedestal material / Type: Quartz
Auto shutter
User interface:
Operation panel: Screen
Indicator type: Touch panel
Operation system: Windows
Dry pumps not included
Power:
Voltage 3Phase: 480VAC
Voltage single-phase: 3
Frequency: 60Hz.
ASM A 412 is a diffusion furnace and accessorie that is commonly used in the semiconductor industry for production of semiconductor wafers. The furnace consists of a high power, gas-tight, temperature-controlled chamber that is connected to a number of sources of gas, including nitrogen, oxygen, and hydrogen. The chamber is also fitted with a graphite liner and heating elements that have a wide range of temperatures that are controlled by an in-chamber temperature controller. The chamber also has a number of safety features, such as a pressure release valve and alarms. The gas sources are then connected to the furnace through a solenoid gas manifold that regulates and controls the flow of the gasses, allowing them to enter the furnace in precise amounts as needed. The gas then passes through a number of heating elements, where it is heated, and then enters the main furnace chamber. When inside the chamber, the gas is heated to a specific temperature, depending on the type of process and the wafer that is being processed. The heated gas then diffuses through the graphite liner and onto the wafer, depositing a thin film coating or other layers as needed. A number of accessorie are also available for ASM A412, including load locks, temperature controllers, and various other types of accessories. The load locks help to keep the wafers in a tightly controlled environment during loading and unloading, while the temperature controllers allow for precise control of the temperature of the gas, ensuring better results. There are also a variety of other accessories available, including quartz heaters, computer controlled systems, and wafer processing equipment. Overall, A 412 is an advanced diffusion furnace and accessory that is widely used in the semiconductor industry to create various processes and products. The furnace is equipped with a variety of safety and control features, as well as a number of accessorie for precise control of the process, and is capable of producing highly reliable results.
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