Used ASM A 412 #9281043 for sale

ASM A 412 is a diffusion furnace that is widely used in the production of high-quality semiconductor materials such as silicon wafers. This furnace is specifically designed to perform a gas-flow diffusion process known as epitaxy and is often used in semiconductor manufacturing and research facilities. ASM A412 is composed of several components, including an oven chamber, a heating element, a nitrogen regulator, and a pressure control equipment. The oven chamber is made of borosilicate glass, allowing it to withstand temperatures of up to 1100°C. The heating element is constructed of molybdenum and tungsten, and is operated at temperatures between 300 and 700°C. The nitrogen regulator is used to control the pressure levels in the oven, ensuring that the temperatures remain consistent throughout the diffusion process. The pressure control system ensures that the pressure levels remain within a specific range, allowing for an accurately controlled environment. A 412 also features an advanced control unit, which includes precise measurements, a pump machine, and a set of computer-controlled sensors. The measurements provided by the sensors allow the user to accurately control the nitrogen levels, heating time, and other diffusion parameters. The computer-controlled pumps are also used to adjust the levels of gases used in the diffusion process, such as nitrous oxide, water vapor, and ammonia. In addition to the oven, A412 includes several necessary accessories, such as a gas mixing tool, an exhaust asset, and temperature sensors. The gas mixing model is used to mix the necessary chemicals for the diffusion process, and the exhaust equipment is used to vent any gases released as a byproduct of the process. The temperature sensors are used to detect any changes in the room temperature, ensuring that the chamber is always kept within safe limits. ASM A 412 is an advanced, highly precise diffusion furnace, providing users with a reliable and efficient production environment for their materials. By utilizing this diffusion furnace, high-quality semiconductor materials can be quickly and accurately produced.