Used ASM Advance 300 VT #9206100 for sale
URL successfully copied!
Tap to zoom
ID: 9206100
Vintage: 1997
Vertical LPCVD furnace
Process: Oxide
CIM
Hardware configuration:
Main system:
Main body (Carrier stage)
Utility box
Handler system:
Wafer handing robot
Boat elevator
Cassette loader
Configuration:
Safety specification: ASM Standard
System layout type: U/Box type (I)
System hand: LL
N2 Load lock
Heater type: Temp wire
Torch heater
Process gasses:
Process gas 1 / N2 (30SLM)
Process gas 2 / O2 (20SLM)
Process gas 3 / HCL
Process gas 4 / N2O
Process gas 5 / H2O
Gas distribution system:
Basic style: Conventional gas system
Tubing material: Stainless steel
Tubing finish: Electro-polished
Manual & air-operated valve: Nupro
MFC Unit
Wafer / Cassette handling:
SEMI STD-Notch, 8"
Cassette type: Entergris / 704-503T2
Cassette number of wafers: 25
Cassette storage: 16
Fork type / Material
Fork variable pitch
Boat / Pedestal: 2 Boat
(150) Production wafers
Boat rotation not installed
System control:
System controller: IBM 486 OS2
Torch controller: H2O Separate element Pre burner
Signal tower colors: G / A / B
General pressure display unit: Pressure PSI
Cabinet exhaust display unit: H20
ASM Furnace temp controller
Host communication
Host communication: User host computer
User host computer I/F: SECS I / II (RS232)
Information transfer protocol: GEM
Equipment host I/F connection: U/BOX Top
Group controller: HIA
Facility electrical equipment power input (2 Lines):
Voltage: 208 VAC, 3 Phase
Voltage: 120 VAC, 1 Phase
UPS Input / Output voltage: 120V / 100V
1997 vintage.
ASM Advance 300 VT is a diffusion furnace and accessory equipment designed for modern wafer fabrication processes. It offers state-of-the-art, high-temperature annealing control and delivers precise uniformity for complex diffusion processes. Advance 300 VT features a unique vertical technology design for increased uniformity, and an innovative two-zone control for superior process control and temperature accuracy. Advanced cooling control system using a combination of cold wall and distributor plate designs ensure maximum throughput and unit efficiency. The machine is equipped with three thermocouple sleeves and up to 24 thermocouple points for superior temperature sensing across the entire wafer. The vertical design of ASM Advance 300 VT eliminates temperature variations across the wafer, ensuring high precision and reproducibility for critical processes. This high-precision tool also provides unparalleled process capabilities, allowing for precise temperature control and tight tolerances. Advance 300 VT is capable of supporting process requirements from conventional wafer manufacture up to very high temperatures for advanced processes such as nanomaterial fabrication. In addition, the asset has the flexibility to accommodate a variety of quartz boat configurations, especially those with intricate design features such as channels and other intricate features. This allows for maximum process flexibility and helps to optimize production operations. ASM Advance 300 VT is capable of sustaining exceptional uniformity of temperature across all wafer positions, due to its advanced heat distribution systems and thermal control systems. Furthermore, it has considerable engineering advantages in terms of its technical design and product flexibility, including low power consumption, a low-profile design, and easy access to all components. It also offers a wide range of options, including a low thermal cycle switch for process optimization, as well as a gravity hinge model for greater flexibility. Overall, Advance 300 VT is a highly reliable and precise diffusion furnace and accessory equipment for modern wafer fabrication processes. It has an advanced temperature control system, superior uniformity, and flexible design capabilities for optimized production operations.
There are no reviews yet