Used ASM MIR 3000 #293639064 for sale

ASM MIR 3000
ID: 293639064
Wafer Size: 12"
Vintage: 2011
CVD Furnace, 12" (2) Chambers 2011 vintage.
ASM MIR 3000 is a state-of-the-art diffusion furnace specifically designed to rapidly and uniformly heat both thin and thick substrates up to three-inches thick. This durable and robust equipment is capable of processing temperatures up to 2,000°C, making it an ideal choice for metal etching, oxide growth, and dopant activation applications. MIR 3000 features an in-line power control system that enables precise and consistent power delivery throughout the entire etching process. This ensures uniform heating, uniform etch rate, and repeatable results. The unit also incorporates a powerful forced-fan circulation machine that continuously circulates and evacuates the reaction chamber, eliminating carbon diffusion and higher thermal mass load influences. The furnace's advanced design allows uniform heating of largesubstrates, while the efficient helical resistance hearth coil guarantees uniform conduction and reliable operation. The hearth coil is housed in a self-supporting structure, which eliminates any hang-off or extra weight when the furnace is loaded with large substrates. ASM MIR 3000 also offers convenient features such as a programmable digital display, a user-friendly programmable central processing unit with memory functions, and easy-to-operate software for convenient process management. It also has a number of safety features to ensure secure operation and avoid potential accidents, including built-in emergency shutdown and radiation monitoring functions. MIR 3000 is a powerful and reliable tool for industrial processes and various testing laboratories, including those engaged in chemical vapor deposition (CVD), rapid thermal processing (RTP), etching, and beta testing. Due to its temperature range, ASM MIR 3000 can also be used in a variety of annealing applications. Overall, MIR 3000 is a versatile diffusion furnace, capable of consistently and reliably processing substrates up to three inches thick. This robust diffusion furnace is an ideal choice for busy industrial and laboratory needs, providing cost savings and efficient operation.
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