Used ASM MIR 3000 #9358639 for sale

ASM MIR 3000 diffusion furnace is a versatile tool for the semiconductor industry, allowing fabrication of high-quality semiconductor devices including complex three-dimensional structures. The furnace is capable of passivating, implanting and diffusion processes, as well as providing an ideal platform for low temperature annealing and thermal oxidation. MIR 3000 is designed for use with multiple locations and multiple substrates, making it ideal for applications in large-scale production as well as research and development. The furnace's core is composed of an electric resistive element which is heated by a combination of two power supplies, enabling precise control of temperatures up to 1350°C. The inner crucible is manufactured from graphite to ensure uniform heat distribution within the furnace, and the oxidation-resistance of the furnace is achieved with a dense, air-tight insulation. The lifting mechanism and expansion mechanisms provide superior reliability and long-term durability. ASM MIR 3000 features a unique set of accessories, which make the process of diffusion easier, faster and more reliable. The diffusion batch and single dopant injectors allow precise control of the deposition process, while the cooling and heating rate controllers, characterized by a precision of 0.1°C, are used to modulate the temperature of the diffusion process. The one-of-a-kind programmable machine driver ensures that user-defined parameters are consistently applied, facilitating complete traceability of the diffusion process. MIR 3000 also includes Multi-zone Modulation (MZM) units, which offer increased accuracy and safety by providing full control of temperature profiles. The sophisticated MZM is also capable of processing thousands of wafers in parallel at a maximum rate of 900 wafers per hour, perfect for high-speed production applications. The diffusion furnace also comes with a wide range of software and support services, which allow users to monitor, adjust and check the process parameters with ease. The operating software allows users to adjust and monitor parameters of the furnace in an intuitive, graphical way, while the support system gives users access to technical advice concerning operation and safety. Additionally, a host of self-diagnostic tools, with the capability to detect and alert to potential problems before they can become significant. Overall, ASM MIR 3000 diffusion furnace and its range of accessories provides manufacturers with an efficient, reliable and flexible tool for producing complex semiconductor devices. The precise control over temperature and user-defined parameters give MIR 3000 the capability to process millions of wafers per hour with perfect accuracy and repeatability, making it perfect for both high-speed production and intricate research and development applications.