Used ASM UHV-A600 #9144820 for sale

ASM UHV-A600
ID: 9144820
Wafer Size: 8"
Thermal HSG system, 8".
ASM UHV-A600 is a diffusion furnace and accessories, used for laboratory crystal growth. This advanced equipment is designed for reliable, safe, and reproducible epitaxial deposition processes while capturing accurate and repeatable data. UHV-A600 is a dedicated thin film deposition system. It utilizes Varian's Turbo Molecular Pumping Unit to achieve the highest pumping speed and lowest electrical load in the industry, while maintaining consistently high vacuum. This helps optimize the raw material deposition rates and ensures the highest quality films. ASM UHV-A600 is compatible with all commonly used growth substrates and molecular beam epitaxy sources and equipped with a 2D mapping array for monitoring substrate temperatures, allowing for precise control over film deposition. The machine is designed for high throughput. With its advanced design, as well as fast-response elements, UHV-A600 allows for faster production of thin film samples for wide-angle x-ray diffraction analysis. The tool is fitted with a gas line interface and multiple ports to ensure a stable, pure environment free from oxidation for sensitive deposition process. ASM UHV-A600 also includes a fully automated preconditioning chamber. This chamber is designed to remove surface contaminants prior to film deposition. Additionally, the chamber is equipped with an inert gas purification asset and Turbo Molecular Pumping (TMP) to further optimize the environment. In addition to UHV-A600, Varian supplies multiple heating elements and sample chambers to accommodate every deposition process. These elements include infrared (IR) lamps, resistive heating elements, and quartz enhanced lamps. Each provides uniform heating for characterizing film deposition. Furthermore, the Advanced UHV Systems include a multi-zone diffusive heaters which allows for a more complex growth environment. ASM UHV-A600 also includes a temperature-controlled substrate chuck, which can be used to fine-tune substrate position during deposition. Additionally, the chuck is equipped with an optional sample cooling stage which allows for precise control of film thickness. UHV-A600 also includes advanced instrumentation. This includes the ABelec 500 voltage supply, which provides stable, repeatable performances with low noise spectra. This ensures an accurate depiction of the deposition process and enables accurate data capture. To complete the model, ASM UHV-A600 also includes a vacuum management equipment. The system is designed to perform precise automated valve sequencing, generate fast cycle times and to reduce handling errors. The vacuum management unit also includes a remote control station for monitoring of the machine's conduct. All together, UHV-A600 is an advanced and versatile diffusion furnace for laboratory crystal growth. It is designed for reliable, safe, and reproducible epitaxial deposition processes while capturing accurate and repeatable data. With its dependable tool design, as well as advanced instrumentation, ASM UHV-A600 is the perfect tool for thin film deposition processes.
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