Used ASYST / PST Melitas F30 #293668011 for sale

ASYST / PST Melitas F30
ID: 293668011
Wafer baking system.
ASYST / PST Melitas F30 is a state-of-the-art diffusion furnace equipment for the thermal treatment of substrates. This system is suitable for a range of advanced processes like metalorganic chemical vapour deposition (MOCVD), atomic layer deposition (ALD) and epitaxy. The unit consists of an F30 furnace with the ability to perform rapid thermal processing, as well as a 7-vacuum cycle loadlock, to transport substrates into and out of the chamber. The furnace is constructed from high-vacuum rated stainless steel and has a usable chamber size of 25-inch by 25-inch. It can accept substrates up to 8-inch in diameter and up to 0.15 inches thick. The F30 diffusion furnace can handle substrates up to 950°C. It is designed for optimal uniformity and uniformity of the temperature across the chamber. This is accomplished with an array of multi-zone heaters and advanced in-situ temperature controllers, with high accuracy sensors and temperature control algorithms. In addition, the F30 diffusion furnace is also equipped with a CCD camera to monitor the substrates during processing. The camera can be used to obtain real-time information about the evaporation and condensation processes, as well as to verify cleanliness and cleanliness of the chamber. The substrate carriers used in the F30 furnace are constructed from high-temperature aluminum alloy and lined with high-temperature insulation for maximum heat retention. The carriers feature quartz strobes, for improved vacuum purging performance, as well as a central RF coil, for precise substrate temperature control. The machine is compatible with PST and ASYST Melitas' range of accessory products. These include cold traps for cryogenic applications, loadlocks for low vacuum applications, stainless steel sample trays, quartz interface components, and replacement heater elements. The F30 diffusion furnace is a reliable and cost-effective tool for the thermal treatment of substrates. It is robust and easy to use, making it a great choice for a wide range of advanced process applications.
There are no reviews yet