Used ASYST / PST Melitas F30VD #9246528 for sale

ASYST / PST Melitas F30VD is a diffusion furnace and accessories for high-performance doping of silicon wafers. It is designed for applications where low-temperature/high-precision diffusion processes are required, such as production of light-emitting diodes (LEDs), light-absorbing diodes (LADs), solar cells, and other high-performance electronics. The fossil-free auto-loading system permits frequent doping of up to 14-inch diameter silicon wafers, with non-uniformity of less than 2%. A repeatable heating process using vertical hot-wall and natural convection ensures excellent temperature uniformity across the wafer diameter. This diffusion furnace is capable of stable temperature control over a wide range with independent control of process temperatures up to 1250°C in a vertical furnace. It also features vacuum-furnace cycle capabilities and high-pressure gas control for both uniform and localized high doping of silicon wafers. The gas flow configuration can be designed for a variety of doping techniques, depending on the application. Benefits of PST Melitas F30VD diffusion furnace include reduced cycle times of up to 40%, improvements in selectivity and lateral uniformity, as well as precise doping levels with magnification of dopant distributions. Additionally, the computer-controlled gas delivery and patented hot-wall controls minimize any impact of surface contaminants on the diffusion process. The integrated manipulator and removable wafer cassette ensure safe and easy transfer of silicon wafers with minimal handling and reduced contamination. ASYST Melitas F30VD diffusion furnace offers reliable, consistent results due to its flexible design and ability to interface with process and control systems. With an enhanced feature set, such as the automatic dopant-sending system, integrated process flow debugging, and adjustable crystal profile tuning, this diffusion furnace is ideal for high-volume production of high-performance electronics.