Used BENEQ P400A-034 #293830577 for sale
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ID: 293830577
Atomic Layer Deposition (ALD) system
Chamber
Gas/precursor manifold
Control enclosure
Norcimbus mini monitor
Plus gas-panel monitor
JULABO / FP 51
Refrigerated circulator
EDWARDS / iH600
Vacuum pump
Vacuum vessel
MKS mass-flow control
Intellisys IQ throttling valve
Laptop/process interface
Power supply: Rated 3×208 VAC + N + PE, 60 Hz.
BENEQ P400A-034 is a state-of-the-art diffusion furnace equipment designed for the precise and uniform diffusion of dopants in semiconductor materials. This advanced furnace system is equipped with a range of accessories and features that facilitate efficient and reliable diffusion processes, making it an essential tool for research and production in the semiconductor industry. The main chamber of P400A-034 diffusion furnace is constructed from high-quality materials that ensure uniform temperature distribution and thermal stability throughout the process. This chamber can accommodate a wide variety of sample sizes and shapes, making it versatile and suitable for various applications. The heating elements inside the chamber are designed to provide precise temperature control, allowing users to achieve the desired diffusion profiles with high accuracy. One of the key features of BENEQ P400A-034 diffusion furnace is its advanced gas delivery unit. This machine enables precise control of the gas flow rates and composition, ensuring optimal diffusion conditions for different dopants and materials. The gas delivery tool includes mass flow controllers, pressure regulators, and gas mixing capabilities, allowing users to create custom gas atmospheres tailored to their specific requirements. To further enhance the diffusion process, P400A-034 diffusion furnace is equipped with a sophisticated temperature profiling asset. This model allows users to monitor and control the temperature gradients inside the chamber in real-time, ensuring uniform diffusion profiles across the entire sample. The temperature profiling equipment can also be interfaced with external software for data logging and analysis, providing valuable insights into the diffusion process. In addition to its advanced features, BENEQ P400A-034 diffusion furnace comes with a range of accessories that further enhance its functionality. These accessories include quartz and silicon carbide boats for sample handling, as well as wafer carriers and trays for easy loading and unloading of samples. The furnace is also equipped with a safety interlock system that ensures user protection during operation and maintenance. P400A-034 diffusion furnace is controlled by a user-friendly interface that allows for easy operation and programming of diffusion processes. The interface features a touchscreen display with intuitive controls, making it simple for users to set up and monitor diffusion runs. The furnace also has multiple pre-programmed diffusion recipes that can be easily accessed and modified to suit specific requirements. Overall, BENEQ P400A-034 diffusion furnace is a cutting-edge tool that offers unmatched performance and reliability for diffusion processes in the semiconductor industry. With its advanced features, precision control, and versatility, this furnace unit is an essential asset for research laboratories, universities, and semiconductor manufacturers looking to achieve superior dopant diffusion results.
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