Used BRUCE BDF-4 #72491 for sale

BRUCE BDF-4 is a high-performance diffusion furnace used for making precision controlled changes to the surface or bulk of metals, ceramics and glasses. It uses diffusion techniques to create thin films, diffusion barriers, getters and other components. The furnace consists of a top-loaded cabinet with a reaction chamber at the bottom. Within the chamber is a gas inlet, gas outlet and a thermocouple to measure the temperature of the chamber. The chamber has a working temperature range of 670-1600°C and can be operated in both horizontal and vertical orientations. The chamber sits on a ceramic base that sits on a riser with guide pins on the outside edges. The riser can be moved up and down using a manual hand crank and is used to accommodate different size pieces. A crucible holder, shelf and crucible can be placed on the riser and the shelf can be adjusted for different operating heights. BDF-4 also comes with a vacuum system to create a vacuum environment in the chamber when needed. The vacuum pressure can be controlled via a vacuum/pressure regulator according to the reaction requirements for the process. The furnace also features a high-performance gas control system which allows for the introduction of multiple gas species without loss of the vacuum in the chamber. The gas control system includes an adjustable gas inlet, with a built-in temperature control, an adjustable gas outlet and an optional external sensor to monitor the exact amount of gases present in the chamber. BRUCE BDF-4 also includes a high-temperature timer to ensure accurate and repeatable timing of processes that require precise duration. In addition, the furnace includes a cooling fan and an anemometer to precisely control the cool-down phase of any reaction taking place in the chamber. BDF-4 is an exceptional diffusion furnace, which has a wide range of applications for making thin films, diffusion barriers, getters and other components. With its adjustable gas inlet, gas outlet and the ability to introduce multiple gas species without jeopardizing the vacuum, this furnace is ideal for conducting complex and precise diffusion processes.