Used BRUCE BDF-41 #9298988 for sale

BRUCE BDF-41
ID: 9298988
Wafer Size: 6"
Horizontal furnace, 6".
BRUCE BDF-41 is a high temperature diffusion furnace manufactured by BRUCE and renowned for its advanced oxidation mechanisms. It comes with several special features that make it particularly suited for applications of advanced materials processing such as silicon- based transistors, integrated circuits, and other optoelectronic materials. BDF-41 is made up of three major components: the control panel, the diffusion furnace chamber, and an adjustable base. It is designed for semiconductor oxidation processes and features a streamlined design that increases safety and reduces the risk of temperature disturbances. The interconnected parts allow for programmable temperatures from 250°C to 1100°C for both uniform and reduced atmosphere operations. BRUCE BDF-41 is equipped with a multi-zone chamber design, a dual range convection air system, and advanced temperature control technology for accurate temperature control and uniformity. Numerous sensors are located throughout the chamber for efficient heat transfer and uniform security. The furnace also includes a computer control panel, enabling users to program custom heating cycles and control the process through a touchscreen interface. BDF-41's adjustable base with four leveling points allows for precise location and alignment, even in changing environments. To ensure uniformity, the chamber is held in place with reinforced aluminum frames that prevent any temperature-related misplacement. It also comes with a safety chamber shield that protects the user and the product during operation. BRUCE BDF-41 is an invaluable tool for advanced materials processing and is suitable for many laboratories and research environments. With its efficient multi-zone design, dual range convection air system, and advanced temperature control technology, BDF-41 is an ideal piece of equipment when it comes to precision temperature control and uniformity.
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