Used CANON / ANELVA COSMOS 300 I-1201 #9210942 for sale

CANON / ANELVA COSMOS 300 I-1201 Diffusion Furnace is a high-precision deposition system designed for fabricating large area device structures with atomic level accuracy. This system is equipped with a 12-inch wafer capacity furnace and is capable of ultra-high vacuum operation for thermal treatment of wide-ranging materials, including sapphire, silicon, oxidation/doping, and optical coating. It features a hot-wall design, wherein the gas is introduced over the surface of the substrates or supplies in a radial direction, and provides a uniform temperature and gas flow for precise control of the deposition process. It also includes a 300mm wafer process area which safeguards the operator and makes the system even more flexible by allowing for a variety of automated processes to be engaged. It utilizes DC and RF power sources for bipolar and monolithic processes, which help in fully controlling the process. CANON COSMOS 300 I-1201 diffusion furnace is suited for high temperature deposition processes, such as polysilicon, tungsten silicide, titanium silicide, aluminum silicide, and silicon epitaxy, and has a variable temperature range of up to 1250 °C and a vacuum range of 5 x 10-8 torr. Additionally, it supports up to four gases for deposition and etching process as well as optional liquid injection. Its oxygen concentration range is optimized to support the deposition of oxides through either dry or wet oxidation processes, and its Hydrogen/Nitrogen and Argon/Hydrogen ratios can be easily modified to accurately control the etching rate. ANELVA COSMOS 300 I-1201 diffusion furnace comes with various useful accessories, such as an Epi Ring wafer chuck and Sample probe, a Multi-Gas Outlet for controlling gas flow, a High-Voltage Power Supply for controlling the crystal growth, and a high-pressure gas bottle holder for direct gas supply. Its quick-change quartz and alumina susceptors can accommodate wafers up to 300mm in diameter, making them easily exchangeable for various process requirements. Furthermore, its PIP (Pressure Indirect Programmable) technology and up to 4-gas controller enables outstanding chamber pressure control and recipe memory for repeatable accurate processes. Therefore, this diffusion furnace provides reliable and high-quality deposition processes.