Used CENTROTHERM c.PLASMA AlOx #9409520 for sale

CENTROTHERM c.PLASMA AlOx is a diffusion furnace and accessories which has been developed to meet the increasing demands of compound semiconductor production processes. It is a high-performance tool for deposition of aluminum oxynitride (AlOxN) layers and other compound semiconductor materials with excellent uniformity and reproducibility. Its plasma source technology ensures a homogeneous ion flux across the entire sample. CENTROTHERM c.PLASMA AlOx offers fully automated process control, including automatic adjustment of the vapor pressure and flux, allowing precise, repeatable results. The integrated RF source is capable of producing plasma with low-resistance, homogeneous profile. The ultra-low-pressure, nitrogen environment ensures that all deposited layers remain clean. CENTROTHERM c.PLASMA AlOx offers precise temperature control, with a range of 100°C to 1,000°C, and can be used for a variety of processes including kinetic vapor deposition (KVD), rapid thermal processes (RTP), and rapid thermal annealing (RTA). It also has an advanced vacuum equipment, with getter, turbo and rotary pumps and pressure gauges, designed to quickly and reliably evacuate the chamber. The entire CENTROTHERM c.PLASMA AlOx system is composed of a reaction chamber, plasma source, RF generator, independent PT 100 thermocouple, vacuum unit, and optional gas feed. The reaction chamber is purpose-built for growing compound semiconductor materials and is constructed from AISI stainless steel for corrosion-resistance. Ventilation and cooling are provided via a high-pressure fan, endothermic and exothermic heaters, and heat exchange circulation. The base machine also includes an integrated resistive heating element, allowing samples to be heated consistently and uniformly. Different wafer holders can be used in conjunction with the reactibility chamber to support various sample geometries. CENTROTHERM c.PLASMA AlOx can be controlled remotely via a user-friendly graphical user interface, through which all of the necessary process steps can be performed. It can also be integrated into most semiconductor production lines and connected to monitoring systems. Overall,CENTROTHERM c.PLASMA AlOx is a powerful and reliable tool for achieving tight process control in the production of compound semiconductors. With its integrated RF source, precise temperature control, and other advanced features, it provides an ideal solution for producing high quality and reproducible metal oxynitride layers.