Used CENTROTHERM Centronic E1200 HT 260-1 #9163724 for sale

CENTROTHERM Centronic E1200 HT 260-1 is a world-wide class diffusion furnace and accessories specifically designed to automate and optimize production processes for semiconductor applications. The E1200 HT 260-1 offers a powerful multi-zone gas-fluxed thermal processing chamber with precise temperature and process control, allowing for substrate mobility and zone flexibility while reducing nitrogen consumption compared to conventional diffusion furnaces. With built-in monitoring and control of both temperature and compound concentrations, this equipment significantly improves uniformity and efficiencies on wafer substrates of any size. The advanced diffusion furnace design of the E1200 HT 260-1 allows for a variety of process functions and flexibility for varied substrate sizes. The protective glass panel contains a large, easy-to-use touchscreen control system with graphic-based software that gives the user the ability to program a variety of functions, including individual zone selection, temperature control, and deposition rate settings. The gas panel is equipped with a flow rate regulator to precisely adjust the rate of nitrogen or argon during the diffusion process. The E1200 HT 260-1 features a robust stainless steel chamber design with an improved insulation unit for the highest level of temperature uniformity and efficiency. The unique gas thermal-distribution technology (GFT) provides high uniformity across the substrate with excellent temperature stability. In addition, the chamber incorporates advanced etching capabilities for silicon substrates. Sensor-controlled thermocouples within the chamber are used to monitor and control the temperature status in each zone. The E1200 HT 260-1 is a user-friendly machine that provides the ability to conveniently store, recall, and revise recipes directly from the main control station. The tool has the capability to network with PC and CAM systems for automated recipe selection and monitoring of the wafers during processing. Additionally, the interchangeable subsystems allow for easy switchover between diffusion and etching processes in one single, compact unit. Centronic E1200 HT 260-1 is an ideal diffusion furnace that meets the most stringent semiconductor device requirements. With the combination of the sophisticated controller, reliable chamber design, and the advanced process features, the E1200 HT 260-1 offers a highly efficient thermal process suite to meet the toughest application requirements.