Used CENTROTHERM E2000 HT 410-4 #9250379 for sale

CENTROTHERM E2000 HT 410-4 is a state-of-the-art diffusion furnace and accessories used for vacuum thermal processing in wafer fabrication. The furnace is designed for use in a vacuum environment, with a vacuum chamber and a vacuum equipment that are capable of producing and maintaining a low atmospheric pressure. CENTROTHERM E2000HT 410-4 uses a refractory pre-heat zone along with graphite heating elements, that provide fast and accurate control over the wafer temperature. The diffusion zone is composed of vertical quartz tubes that provide a distributed flow of gas to ensure a homogeneous and optimal temperature profile. E2000-HT 410-4 is equipped with a precision, high-pressure controller that maintains the optimal vacuum pressure inside the processing chamber. It also features a dynamic pressure monitoring system, which continuously records exact performance data for problem-solving and performance optimization. CENTROTHERM E2000-HT 410-4 is able to process up to four wafers at once, and it is designed for both ultra-high precision and low temperature operation. It is capable of temperatures ranging from 25°C to 1600°C, and is able to provide precisely controlled temperatures up to 720°C faster than a conventional refractory-based design. This flexible furnace also comes with a wide range of accessories to support its many applications. These include a vacuum/gas mixing unit, a back-filled stainless steel bellows, a multi-zone temperature controller, a He-N2 gas flow control, an advanced insulation machine, and a multi-zone temperature monitoring tool. Additionally, the furnace comes with a graphite susceptor, a substrate holder, and an inert gas delivery asset for uniform gas distribution throughout the stage. E 2000 HT 410-4 is a reliable and high-performance diffusion furnace and accessories, providing incredible precision and control when it comes to vacuum thermal processing in wafer fabrication. It is a great tool for achieving ultra-high precision, and it can handle a variety of processes and temperatures, ensuring that users get the most out of their thermal processing.