Used DSI SD-200 #156913 for sale

DSI SD-200 furnace is an advanced diffusion equipment designed to provide rapid, high-frequency diffusion of gases, such as Nitrogen, Argon and Hydrogen, into silicon wafers during the manufacturing process. The system utilizes an innovative four-zone zone furnace design to achieve very precise temperature control and uniformity across the entire furnace. This helps to ensure that the desired diffusion of gases into the wafer is achieved in a consistent manner. The unit also offers a unique cooling machine which helps to keep the temperature of the entire tool stable and uniform over time, thus further increasing the quality and efficiency of the diffusion process. SD-200 diffusion furnace consists of a three-zone inductive heating module, a solid-state power supply driving either power-generator or thyristor-controlled solid-state switched LC-filtered loads, a control module, and a software control panel. The three-zone heating module contains three unique heating zones with separate temperature sensors. By using this asset, the temperature in each zone can be precisely controlled, allowing for uniform application of heat and diffusion of gases into the target material. This allows for efficient and consistent material diffusion. The solid-state power supply supplied by the model is designed to provide repeatable, reliable performance and is designed to be highly capable of delivering required control power to both the power-generator and thyristor-controlled solid-state switching LC-filtered loads. By combining this device with the three-zone inductive heating module and a software control panel, DSI SD-200 diffusion equipment is capable of providing accurate and repeatable diffusion results. Finally, the system is accompanied by an array of accessories and components. These include a power compensator, temperature controllers, valving modules, filters, sensors, and inert filling pipes. All of these components can be used to further improve the accuracy, repeatability, and efficacy of the diffusion process. SD-200 diffusion furnace is designed to provide an efficient and reliable diffusion solution for semiconductor manufacturers. By combining advanced components and a controlled heating module, the unit is capable of providing repeatable and consistent results. Through the use of an innovative design and the accompanying accessories, DSI SD-200 diffusion furnace provides a convenient and reliable tool for semiconductor manufacturers.