Used EUGENE BJM3000 #9311273 for sale

EUGENE BJM3000 is a diffusion furnace and accessory equipment used for the diffusion of various materials used in industries such as semiconductor device production. The system consists of three main components: the main furnace, the diffusion chamber, and the ancillary accessory unit. The main furnace of BJM3000 features a large thermal mass and is able to provide a range of temperatures from 0 to 1650°C. It has dual Silicon Carbide (SiC) heating elements with independent power regulators delivering precise thermal control. The main furnace is also equipped with two vacuum pumps, an inert gas inlet, and an exhaust vent for improved process atmosphere maintenance. The diffusion chamber is capable of diffusion process runs at temperatures between 480°C and 1050°C. The chamber houses a multi-zone quartz hearth plate which serves as the source of process material. The quartz hearth plate is designed to allow the diffusion gases to interact evenly with process wafers. The ancillary accessory unit in EUGENE BJM3000 includes a unit gas box for gas distribution and injection, a vapor injection manifold, and a gas cleaning machine for both gases in the process chamber and exhaust out of the tool. It also features a remote monitoring and control console with graphical user interface, allowing for dynamic reaction adjustments when necessary. BJM3000 offers a range of optimized solutions, ranging from ultra-low-temperature furnaces to high-temperature diffusions. Its efficient thermal management provides high-performance, reliable, and cost-effective diffusion solutions for high-end semiconductor device production.