Used EUGENE Cardinal2000 #9282138 for sale

EUGENE Cardinal2000 is a high-yield ion implantation furnace and equipment for semiconductor manufacturers. This diffusion furnace and accessories are designed to provide precise control and accuracy in the ion implantation process. The system ensures exceptional performance and heat control, enabling efficient production of sub-micron structures. The furnace has a long quartz tube with heat-resistant ceramic faces and an external shell that are filled with heating wire. This allows for the most efficient and uniform diffusion of temperature throughout the unit. The unit is also equipped with a high temperature SiC powder coated shell for optimized safety and protection. To ensure a minimal share of the process, Cardinal2000 is outfitted with advanced modular control systems. This includes integrated and accessible PLCs, intuitive operating software, and real-time displays of an implant machine. These controls allow for rapid product changes with precise control, resulting in improved yields and highest quality product. Additional features of EUGENE Cardinal2000 include an all-ceramic EMI shell, gas analysis and feedback, and contact-less cassette handling. The EMI shell with ceramic plates eliminates unwanted electrical and magnetic disturbances, resulting in deeper dopant diffusion. Furthermore, the gas analysis and feedback provide optimal process control and repeatable performance. Finally, the contact-less cassette handling allows for the transfer of wafers without contact. Cardinal2000 is an ideal choice for semiconductor manufacturers who require close tolerances and exacting control in their diffusion processes. With its high-temperature performance, safety-first design, integrated control systems and contact-less cassette handling, the tool will enable manufacturers to achieve the highest yields and product quality.