Used FUJIFILM TC 2000 #9399084 for sale

FUJIFILM TC 2000 is a diffusion furnace and associated accessories, used principally in semiconductor manufacturing operations. Its purpose is to ensure the successful deposition of extremely thin metallic layers onto silicon wafers. TC 2000 features a primary chamber with four zones of stainless steel construction, and a secondary chamber with two separate zones. Inside the primary chamber is a thermally insulated, self-sealing thermal barrier, and a gas-flow based exhaust system. The four zones can be independently controlled and are used to carry out various types of process steps, such as oxidation, nitriding and deep layer diffusion. FUJIFILM TC 2000 makes use of an array of resistive heating elements, which generate direct electrical energy converted into thermal energy. This is transferred to the thermal insulation layer, which ensures even and uniform heat distribution. The individual heating element temperatures are controlled using adjustable temperature controllers, to ensure a consistent process. An advanced PLC-based closed loop control system manages the programming and operation of TC 2000. This includes PID-controlled process chamber temperatures, door operations and alarm management functions. A user-friendly touchscreen interface makes programming FUJIFILM TC 2000 quick and easy. TC 2000 is suitable for a wide range of application scenarios, such as for film growth, activation reflow, dopant diffusions and pre-heat treatments. It is also designed to be used with a wide range of compatible accessories such as thermal guards, continuous shafts and removable vacuum ports, allowing it to be used in a variety of settings. In its standard configuration, FUJIFILM TC 2000 comes with a Mitsubishi controller, diffusion elevators and mesh type heating elements to facilitate precise layer thickness control. It also includes a variety of safety features, such as a vent port for evaporated gas, a safety interlock and a pyrometer for temperature measurement. Overall, TC 2000 is a reliable and powerful diffusion furnace which is designed to meet the highest manufacturing requirements. By taking advantage of its advanced control and heating elements, FUJIFILM TC 2000 can be used to consistently deliver thin and complex metallic layers with high accuracy and repeatability.