Used HITACHI / KOKUSAI DD-1206VN-DM #9281054 for sale
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ID: 9281054
Wafer Size: 12"
Vintage: 2004
Diffusion furnace, 12"
Quixace I / QWM
Furnace:
Quixace-mini (Silica bake) furnace
D4EX25085 Heater
RHC Heat (Quick-cooling)
RC-100 Exhaust pressure controller
Furnace mount
Scavenger
Process exhaust duct
Automation:
I/O Shutter
FOUP Transfer unit and loader
Rotation FOUP rack unit: 12-Step carrier stage
FOUP Opener unit
Wafer detect unit
Notch detect unit
Wafer transfer unit
Boat elevator unit: Up/down
Boat rotation unit
Furnace shutter unit
Gas (N2, O2):
Gas pressurized unit: Silica bake
Gas detector
Gas box
Controller:
CX3010 Controller
CQ1700 Temperature controller
Power control unit
2004 vintage.
HITACHI / KOKUSAI DD-1206VN-DM is a diffusion furnace and accessories package that provides an automated, high-performance solution for rapid thermal processing of a variety of semiconductor substrates. The furnace consists of a quartz tube and graphite resistive heater connected to power supply control unit, a flow equipment for gas introduction, a temperature control unit for temperature set-point and monitoring, and a Vacuum Pump to run the entire system. The expansion box features multiple temperature zones, enabling it to process several substrates simultaneously with independent heating zones. The diffusion furnace is designed for a variety of semiconductor processes and wafer sizes, ranging from 150 to 300 mm, for both CVD and PECVD applications. It features a high-temperature range of up to 1,250°C, and tight temperature control with a variation of ± 0.1°C and a uniformity of ± 0.25°C, allowing for optimization of thermal processes. The unit also boasts a high-efficiency air flow, providing uniform thermal treatments and improved throughput. Its Degassing Kit is also available to reduce oxygen level for oxide etching and deposition. In addition to the furnace, HITACHI DD-1206VN-DM includes accessories such as a hotplate, susceptor carriers, high-temperature gas inlet tubing, and a loading manhole that allow for easy access to substrates that need to be processed. Its robust construction ensures reliable performance while its advanced microprocessor-based controller provides improved heating control compared to other diffusion furnaces on the market. KOKUSAI DD-1206VN-DM is ideal for processes like oxidation, annealing, diffusion, and film deposition, and can be utilized in various industries, including consumer electronics, solar cells, bio-sensors, and medical instruments. With its high-precision temperature control, efficient air flow machine, and wide selection of accessories, DD-1206VN-DM can meet the demanding requirements of modern thermal processing.
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