Used HITACHI KOKUSAI DD-1223VN #9293898 for sale

HITACHI KOKUSAI DD-1223VN
ID: 9293898
Wafer Size: 12"
Furnace, 12" Process: ALD-TiN.
HITACHI KOKUSAI DD-1223VN is a high performance diffusion furnace designed specifically for the diffusion process. It has the ability to process a wide range of products, from semiconductor devices to other products such as wafers, powders, and thin films. The high power diffusion process is possible with the furnace's semi-reactor chamber, allowing a high level of efficiency and power. It features a durable stainless steel construction with a graphite heating element that ensures reliable operation even under high temperature conditions. The furnace has two independent controllers, which allow for effective heating control, temperature profile settings, and cycle repeatability. The furnace also has a built-in safety system, which is essential when diffusion furnaces are used in the semiconductor device production environment. This ensures a safe and reliable operation without any possibility of explosions or other accidents. It also has an automatic gas shut-off system to ensure that oxygen will not enter the process area. One of the most impressive features of DD-1223VN is its outstanding accuracy and repeatability. This ensures that the processes of diffusion are qualified and reliable. The furnace also has an excellent temperature uniformity, so-called "hot spots" are avoided at all times during the process. In addition, the furnace also features two independent temperature sensors (K-type thermocouples), along with two independent gas lines, meaning that two different gases can be used in different areas of the furnace simultaneously. This allows for multiple layers of diffusion processes on the same substrate. Furthermore, it also has a gas mixing chamber to provide precise control of the gas flow and concentration. To guarantee the best efficiency of the diffusion process, the furnace also features a high-precision gas injection system. This ensures that the gas is properly injected and distributed throughout the chamber, resulting in a homogenous process. Moreover, an inert gas can be supplied through an inlet on the side of the furnace for added safety and uniform process conditions. Finally, HITACHI KOKUSAI DD-1223VN also includes a low-cost, unequalled on-site installation service, which ensures that the installation process is as easy as possible. With these features, this diffusion furnace offers exceptional performance and reliability, making it ideal for use in any application.
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