Used HITACHI / KOKUSAI DD-1223VN #9351395 for sale

HITACHI / KOKUSAI DD-1223VN
ID: 9351395
Wafer Size: 12"
Vintage: 2006
Diffusion system, 12" 2006 vintage.
HITACHI / KOKUSAI DD-1223VN Diffusion Furnace is a high-precision production tool for electronic industry silicon wafer production. This furnace is designed to provide superior accuracy and uniformity in diffusion processes for silicon wafer fabrication. HITACHI DD-1223VN diffusion furnace includes an advanced temperature control unit with a wide range of temperature ranges for precise thermal control during diffusion operations. The furnace is powered by a high-frequency power supply equipment, which reduces power consumption and provides more accurate control over the working temperature range of the furnace. The furnace is constructed from high-grade stainless steel and is built to handle high temperature and pressures for industry-grade operations. The universal design of KOKUSAI DD-1223VN is designed to makeloading and unloading easy and to ensure uniformity of wafer temperature over its entire working range. The furnace's high-precision temperature control unit includes an integrated infrared pyrometer for real-time temperature monitoring. This provides consistent results with repeatable thermal inputs for uniformity of the process. The heat is generated by an energy efficient heating system which ensures a more stable, accurate diffusion process. The included quartz boat houses the wafer during processing and allows for rapid and uniform diffusion operations. DD-1223VN also includes a variety of accessories to enhance the user experience. The furnace includes an exhaust unit to improve the diffusion process by venting out any volatile gases. A variety of external temperature sensors and monitors are also available to better control and monitor the furnace environment. In conclusion, HITACHI / KOKUSAI DD-1223VN Diffusion Furnace is a versatile and highly accurate production tool for the electronic industry. Its high-precision temperature control, energy-efficient heating machine, and a wide variety of accessories make it a great option for high-temperature silicon wafer diffusion operations.
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